HUETTINGER Electronic offers a broad range of direct current (DC) power supplies for plasma excitation. Proccesses include magnetron sputtering, DC bias, cathodic arc sputtering and High Impulse Magnetron Sputtering (HIPIMS).

Models are available from 1kW to 240kW with standard, bi-polar pulsed and High Impulse outputs.

HUETTINGER offers one of the most sophisticated arc management systems available on the market. Our unique Cable Length Compensation ® circuit and our fast arc detection algorithms allow our standard DC power supplies to be used in many metallic and reactive sputtering applications that would otherwise require expensive pulsed DC solutions.