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Hiden Analytical - Plasma Ion Analyzers and Langmuir Probes
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Plasma Characterisation:
A wide range of industrial processes use electrical plasmas and new applications are developing rapidly. In the microelecronics industry the demands of higher yields and shrinking device geometries mean that process reproductability and understanding is vital.
Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.
Products Include:
- EQP - Mass and Energy Analyser for Plasma Diagnostics: The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes
- ESPion, an Advanced Langmuir Probe for Plasma Diagnostics: The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia.
- Vacuum Process Gas Analyser - HPR30: The HPR-30 process gas analysis system is a compact gas analysis system for monitoring residual gases and vacuum processes.
- PSM, a Mass and Energy Analyser for Plasma Diagnostics: The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process
