EQP - for advanced plasma process analysis

Applications:

• Analysis of positive ions, negative ions, neutral radicals and neutrals.
• Etching / Deposition Studies.
• Ion implantation / Laser Ablation.
• Residual Gas Analysis / Leak Detection.
• Plasma electrode coupling - follow electrode conditions during operation.
• Analysis through a viewport, grounded electrode, driven electrode.

Features:

• Software controlled Ion Extraction Optics for minimum plasma perturbation.
• 45° Electrostatic Sector analyser, Scan Energy at 0.05 eV increments/ 0.25eV FWHM.
• Minimum perturbation of ion flight path & constant ion transmission at all energies.
• Differentially pumped Triple filter Quadrupole, mass range options to 2500amu.
• High Sensitivity / Stability Pulse Ion Counting Detector with 7 decade dynamic range.
• Tuneable integral ioniser for appearance potential MS with electron attachment option.
• Penning Gauge and interlocks to provide over pressure protection.
• Signal gating and programmable signal gating option for time resolved studies in pulsed plasma.
• 1000eV Option, Floating option up to 10keV, Faraday Cup for high density plasmas.
• Mu-Metal, Radio-metal shielding options, high pressure operation option.
• MASsoft control via RS232, RS485 or Ethernet LAN.