Product Announcement from Hiden Analytical
State of the art ion gun for surface and depth analysis applications.
- Static and Dynamic SIMS
- Auger Electron Spectroscopy
- Ion Beam Sputtering
- Surface Science Studies
- Rastering / Depth Profiling
The Hiden IG20 Ion Gun for static and dynamic SIMS, featuring:
- Intense ion beam with 100 µm spot size and energies from 0.5 - 5 keV.
- High current density, up to 4.5 mA/cm2.
- Electron impact ion source with Argon and Oxygen capability.
- Steering optics for line scattering and beam rastering in depth profiling.
- 3° offset in the ion gun column for optimum rejection of neutrals.
- Beam blanking facility for rapid beam switching in rastering applications.
- Source differential pumping for reduced chamber gas load.
- Easily replaceable twin filament assembly.
- Sweep rates down to 64 µs.
- Integrated operation with SIM and EQS probes for direct raster rate / area control.
Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package.
- Air stable ion source
- Small mounting flange for flexible installation
- Easy installation of self aligning replacement sources
- Long source lifetime
- Differential pumping to maintain true UHV chamber pressure
- Two lens column design
- Easy replacement of beam defining aperture
Controlled via a windows PC based interface, which handles thermal management of the source, the gun is easy and reproducible to set up and can be configured for high current or small spot applications.
- Energy: 500eV to 5 keV
- Maximum Current: 500 nA
- Minimum spot size: 20μm
- Source lifetime: typically 500 hours
- Mounting Flange: Conflat type DN-35-CF
- Source power: 8W
IFG200 Fast Atom Bombardment Ion Gun
State of the art FAB / ion gun for surface and depth analysis applications
- Static and Dynamic SIMS Studies
- Auger Electron Spectroscopy
- Ion Beam Sputtering
- FAB/SIMS studies of insulators
- Surface Science Studies
- Rastering / Depth Profiling
The Hiden IFG200 Fast Atom Bombardment / Ion Gun for static and dynamic SIMS, featuring:
- 2mm atom or ion beam at energies from 0.5 - 5 keV.
- Charge exchange chamber for ion ® fast atom conversion for FAB studies.
- Electrostatic deflection lens for clean FAB beam.
- High current density and stable positioning.
- 3° offset in the ion gun column for optimum rejection of neutrals in ion beam mode.
- Inert gas and Oxygen capability.
- Differentially pumped source region.
- Easily replaceable twin filament assembly.
- Control unit fully compatible with IG20 high-brightness ion gun.
- Integrated operation with SIM and EQS probes for direct raster rate / area control.
At the Forefront of Analytical Technology
Hiden Analytical celebrates 30 years of design, development and manufacture of quadrupole mass spectrometers. Our products address a diverse range of applications - precision gas analysis, plasma diagnostics by direct measurement of plasma ions and ion energies, SIMS probes for UHV surface science, catalysis performance quantification, thermo-gravimetric studies - over a pressure range extending from 30 bar processes down to UHV/XHV
Scientific Instrument and Equipment Design, Development and Manufacturing from Hiden Analytical
Advanced real-time gas analysers. Continuous sampling of processes and atmospheres near ambient pressure.
CATLAB - Micro-reactor with integrated MS
SpaciMS - 3D catalyst characterisation system
Surface Science & Materials Analysis
SIMS Workstation, SIMS Analysers, Ion Guns and TPD Workstation
HPR - Gas Analysers
with sample inlets to address a broad application range.
Plasma Diagnostics and Plasma Characterisation
EQP, PSM - Plasma ion mass/energy analysers.
ESPion - Langmuir probe.
HPR-100 - Workstation.
Residual Gas Analysers for vacuum diagnostics, leak detection and process monitoring.
Proteus 40- and 80- way Multi-Stream inlet.
and
8-Way Multi-Stream inlet.
IMP- End point detector for ion beam etch.
XBS- Flux rate monitor for MBE
3F Series - Quadrupole Mass Spectrometers
3F/PIC - high speed ion counting
EPIC - with pole bias
Real time analysis of organic vapours and moisture in reactions.
Process monitoring for advanced manufacturing processes.
R&D and process monitoring for gas/vapour analysis.
Exhaust gas emissions, fuel cell technology, catalysts.
Development of special materials, hard coatings and metallurgical films.
Quadrupole mass spectrometry for the food industry.
Scientific Instrument and Equipment Design, Development and Manufacturing from Hiden Analytical
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