Macro to Micro - Defects don't stand a chance

Product Announcement from Leica Microsystems, Inc.

Macro to Micro - Defects don't stand a chance-Image

Inspection, process control and defect analysis of wafers or LCDs and TFTs has to be fast, accurate and ergonomic. Leica Microsystems has many years of experience in developing inspection systems for the semiconductor industry. Using this expertise, we have developed a totally new line of products for the inspection of 8 and 12 inch wafers

New optical features offered by the Leica DM8000 M such as the optional macro mode or the oblique UV illumination (OUV, with i-line UV option) not only improve resolving power but also speed up throughput when inspecting samples with 8''/200 mm diameter.

The illumination is based on the latest LED technology and is fully integrated into the microscope. The low heat radiation and integration into the stand ensures that there is an optimal airflow around the microscope. The long lifetime yet extremely low power consumption of the LEDs offer enormous savings potential.

With a single touch of a button you can change the magnification, the illumination or contrast mode.

Access a comprehensive pdf brochure on the Leica DM8000 M & DM12000 M and check out the interactive Flash Demo

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