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The O3MEGA™ ozone delivery subsystem is the most flexible, versatile and cost-effective ozone generation subsystem available. The O3MEGA subsystem incorporates MKS' field-proven high concentration, ultra clean ozone generation technology in a compact unit requiring up to 60% less space than competing ozone delivery systems. It includes concentration monitoring and flow control as well as pressure control, and is the first ozone delivery system that can be designed directly into the process tool, or it may be integrated into a stand-alone remote ozone delivery system, such as the MKS AX8555.

This turnkey point-of-use subsystem delivers ultra-high concentration ozone with flow rates as high as 20 slm and concentrations of up to 20 wt% (300 g/m3). The advanced, patented cell design converts oxygen to ozone while maintaining low, process-acceptable contamination levels.

Through a variety of communications interfaces, including the MKS TOOLweb® framework and Ethernet, users can remotely perform complete system monitoring and diagnostics. In addition, the O3MEGA subsystem's integrated closed-loop ozone monitoring and control functions allow the user to set and monitor all process parameters (oxygen and doping gas flows, and pressure) remotely.

The O3MEGA subsystem is designed for maximum configuration flexibility and high value, matching ozone output to your process requirements in the smallest, most complete delivery subsystem available. The unit is ideal for use in semiconductor processing applications such as atomic layer deposition (ALD), TEOS/Ozone CVD, Ta2O5 CVD, photoresist strip, wafer cleaning, contaminant removal, surface conditioning and oxide growth.