It is our pleasure to inform that Olympus LEXT OLS-3100 was selected as the winner in this year's competition for Semiconductor International Magazine's Editors' Choice Best Product Award.

The award was presented July 16, 2008 at a special ceremony during SEMICON West in San Francisco, California, to Joel Young, Vice President of Olympus Micro-Imaging, and David Rideout, Olympus Product Manager for the LEXT OLS-3100.

The LEXT is ideal for next-generation micro fabrication devices like MEMS, for new materials development, and for today's thinner devices, with more compact surface mounting requirements.

The LEXT combines a 408nm laser with optics specifically designed for operation at this wavelength to optimize image quality and limit aberrations. Olympus software provides a simple user interface, fast processing and advanced analysis in a single solution.

Brightfield, Darkfield and Differential Interference Contrast (DIC) Microscopy techniques are possible in both video and laser confocal imaging modes. The confocal laser DIC mode is especially useful for highlighting subtle textural variations during surface analysis.

To learn more about the Olympus LEXT and Olympus Industrial Micro-Imaging, please visit our company profile here on Globalspec, or visit the Olympus Micro-Imaging website at www.olympusmicroimaging.com.