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Rogue Valley Microdevices is an industry leader for high quality LPCVD films. You can order LPCVD Nitride as thick as 5μm or as thin as 100Å! Low Stress LPCVD Nitride is one of our most popular films and is often used for building Membranes, Cantilever Beams and other mechanical structures.
Low Stress Nitride is also very effective as a Potassium Hydroxide (KOH) mask and can be deposited up to 2μm in thickness. The film stress <250MPa Tensile Stress.
Our engineers have over 15 years experience in developing, and optimizing LPCVD Nitride films. Our Low Stress LPCVD Nitride process is a mature stable process that you can count on. We believe that our ability to provide you with consistent, high quality Low Stress Nitride will help to enhance repeatability throughout your manufacturing process.
Here is what we offer for LPCVD Nitride:
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We also carry a wide selection of bare silicon wafers for your convenience.
Rogue Valley Microdevices offers the following film deposition services:
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About Rogue Valley Microdevices, Inc.:
Founded in 2003, Rogue Valley Microdevices is the first company to establish a microelectronics manufacturing facility in beautiful Southern Oregon. Headquartered in Medford Oregon, we have quickly established ourselves as one of the premier Thin Films Foundries in the United States by providing our customers with great quality, customer service, and engineering support.
Our manufacturing facility contains processing equipment capable of volume manufacturing yet flexible enough to accommodate wafer sizes from 50mm to 200mm. We offer a variety of processes, including Low Stress LPCVD Nitride, PECVD Oxide, PECVD Nitride, PECVD Silicon Carbide, Thermal Oxidation, Chlorinated Oxidation, N2/H2 Annealing, PVD and Evaporated Metal films to satisfy our customers' needs.