Product Announcements: Thin Film Coating Services

Abrisa Technologies can provide both Indium Tin Oxide (ITO) and Index-Matched Indium Tin Oxide (IMITO) thin film optical coatings for a wide variety of optics applications. The durable coatings provide for an electrically conductive glass surface that offers high optical transparency with transmittance levels that can be in excess of 99% (read more)

Abrisa Technologies applies high precision optical coatings to the surface of glass substrates to alter the interaction with wavelengths of light in terms of reflectance, transmittance & absorption, abrasion resistance & electrical conductivity. The extensive line of coatings includes numerous standard & off-the-shelf treatments for prototype & high-volume production... (read more)

Rogue Valley Microdevices is an industry leader for high quality LPCVD films. You can order LPCVD Nitride as thick as 5μm or as thin as 100Å! Low Stress LPCVD Nitride is one of our most popular films and is often used for building Membranes, Cantilever Beams and other mechanical structures. We have the in-house capability to design and manufacture your complete device. (read more)

Rogue Valley Microdevices offers PECVD Silicon Carbide (SiC), which is a single side deposition. This highly durable thin film can be deposited alone or within stack of PECVD Oxide and/or Nitride. PECVD Silicon Carbide is the perfect choice for use as a hard mask for bulk micromachining of your finished wafers. We are able to process wafer diameters of 50mm up to 300mm. (read more)

PECVD Nitride can be a great alternative to LPCVD Nitride when it becomes important to stay within lower temperature ranges. Widely used in MEMS and Semiconductor processing, PECVD nitride is a tensile stress film that can be used as a passivation layer, or to help balance film stress within a stack. (read more)

Rogue Valley Microdevices is proud to be your leading source of high quality LPCVD films. Our Stoichiometric LPCVD Nitride can be a very effective insulator, and works great as a KOH etch mask when deposited over thermal oxide. We also have the in-house capability to design and manufacture Nitride Windows. (read more)

Silicon Wafers - Because of our ability to process all wafers diameters (50mm-300mm) Rogue Valley Microdevices maintains a diverse inventory for customers whom require either bare silicon wafers or silicon wafers with Thin Films. Our ability to provide you with both thin films services and silicon wafers can help reduce cycle time as well as shipping cost. (read more)

Rogue Valley Microdevices offers Dry Thermal Oxide. Our ultra pure Dry Oxidation process is available for those applications requiring thinner oxides. We offer Chlorinated and Non-Chlorinated Dry Thermal Oxide. Using Dry Chlorinated Thermal Oxide can help your devices perform to their highest potential by eliminating metal ions. (read more)

Rogue Valley Microdevices offers E-Beam Evaporation of metal stacks including but not limited to Nickel, Gold, and Platinum. We can provide just the thin film and also patterning including Metal Lift-Off. Our process capabilities allow us to deposit up to six different materials in-situ if required. We also have the in-house capability to do complete device fabrication for our customers. (read more)

Rogue Valley Microdevices is please to offer you the option of Dry Chlorinated Thermal Oxidation. Our Dry Chlorinated Thermal Oxidation is recommended for use in MOS and other active device fabrication processes. Using Dry Chlorinated Thermal Oxide can help your devices to perform to its highest potential by eliminating metal ions. (read more)