Product Announcements: Lithography Equipment

The Vistec EBPG5200 Series is a further evolutionary progression of Vistec's high-end electron-beam lithography systems now providing full 200mm wafer writing performance. (read more)

The Vistec EBPG5000plus Series are a further evolution of the EBPG4 and 5 systems. The EBPG series has established a worldwide position for advanced nano-lithography applications, particularly in direct writing of both R&D and production GaAs devices. (read more)

The Vistec SB3050 Series - now with a Cell Projection option - is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning down to the 32nm technology node, it features Variable Shape Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization. (read more)

The Vistec SB250 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands. (read more)