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  • Vortex Meters Tap the Motherlode
    The adage, "You can't control what you can't measure," is nowhere so true as in the process contra] industries. Going one step further, it is also necessary to ensure accuracy and repeatability in measurements. And, while you're at it, it is also nice if the measurement device is economical
  • MICRO: Defect/Yield Analysis & Metrology
    optoacoustic metrology instruments can be used to characterize all process stages: the technique can measure film-thickness uniformity before polishing, removal rates at intermediate stages, and the final thickness after polishing. The technology is also suitable for integrated measurement within the CMP
  • MICRO:New Technologies-Analysis & Metrology, by Patrick J. McCann, p.93 (July '99)
    molecular measurements can help increase yields. Instruments based on mid-IR laser technology are compatible with most semiconductor processing equipment. They can simultaneously measure multiple molecular compounds and perform reliable molecular measurements in corrosive environments. This article
  • MICRO: Behind the Mask -Chen (April 2000)
    patterned defect inspection system (KLA-Tencor, San Jose) running the advanced performance algorithm (APA). Both i-line and deep ultraviolet (DUV) Verithoro programmed defect masks from DuPont Photomasks were investigated. Although engineers have traditionally used shearing microscopes to measure

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