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  • Hazardous Atmospheres: Selecting Intrinsic Safety Barriers
    In the last edition of 20/20 Insights we covered the concept of intrinsically safe (IS) systems and how their design limits the release of energy into a hazardous atmosphere to prevent ignition. Now we will look more closely at selecting the right combination of parts to produce a safe and reliable
  • MICRO: The Hot Button
    Center, Freescale Semiconductor): Argon-fluoride (ArF) liquid immersion lithography (IML) has the potential to extend optical lithography to meet the needs of the 32-nm semiconductor device nodes and beyond. Water is the immersion fluid of primary interest because of its low intrinsic absorption at 193

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