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  • Effect of Pulsing Parameters on the P-CFUBMS of Chromium Aluminum Nitride Coatings (.pdf)
    Controlled ion bombardment of growing thin films can be used to modify and improve the film structure and properties. Recently, higher energetic species (up to hundreds eV) were found in the plasma by pulsing the target(s) in magnetron sputtering. In this study, an electrostatic quadrupole plasma
  • Laser Scribing Thin Silicon Nitride Films
    Silicon dioxide and titanium dioxide have been used as AR coatings in solar cells but SiO has a low refractive index whereas TiO does not contribute to surface passivation. Silicon nitride is an important exception to the general rule that carbide and silicide films are usually electrically
  • Tough Coatings
    they can drastically improve performance, boost reliability, and extend service lives of tool and machine components. In addition to conventional PVD hard coatings such as TiN (titanium nitride), so called "tribological coatings " with optimized frictional properties have been developed in recent
    models and strategies are required, in addition to advanced processes and reliable metrology tools. The standard STI etch process involves etching the bottom antireflective coating (BARC), the nitride, the underlying pad oxide, and a shallow trench into the silicon substrate. At the 130-nm
  • Hybrid Ball Bearings
    , alternative ball options become a necessity. The most widely available options for ball bearings are TiC and ceramic balls. TiC balls are 440C stainless steel balls with a titanium carbide coating while ceramic balls consist of silicon nitride, Si3N4, a â polycrystalline material with an amorphous (glassy
  • MICRO:Rosenberg (March 2001)
    nitride (TiN), titanium tungsten, cobalt silicide, tungsten silicide, tantalum, and tantalum nitride. These metal compounds are used for barrier/liner processes because they form high-stress films when deposited. However, high stress, along with plasma and thermal cycling, tends to cause refractory
  • Nanosized resonators show commercial promise
    of 4.5 MHz and a Q of 207,000. Besides having a high quality factor, the stressed silicon-nitride nanostrings are mechanically robust, making them practical for consumer devices. The group has used the nanostrings to detect masses as small as a single bacterium or virus. Coating the device
  • Evaluating the use of hard-mask films during bulk silicon etching
    nitride or thermal oxide (SiO ) cannot be used for this purpose; either films that can be deposited at low temperatures or spin-on coatings are required. The study presented here investigated the use of two such films LPCVD silane-based silicon

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