HUETTINGER Electronic, Inc. - Product Announcements

When cost is a factor, this technology offers one of the most economical solutions. These power supplies, can be used for a variety of DC plasma processes such as for magnetron sputtering, DC biasing, cathodic arc sputtering and High Impulse Magnetron Sputtering (HIPIMS). (read more)

As the leading manufacturer of generators for large-area coating worldwide, HUETTINGER offers the best there is in generators in the medium-frequency range. (read more)

Radio Frequency (RF) generators for plasma excitation are useful for a variety of sputtering and etching applications. Many critical processes can only be successfully performed with RF solutions. (read more)

High power lasers can be used for applications such as cutting, welding and marking. This non-contact method of material processing offers many advantages such as flexibility, high speed and superior quality. Lasers simplify the entire fabrication chain. (read more)