- Adjustable Oscillating Spray Nozzles & Pressures
- Manual Wafer Loading or Automated Transfer
- Precision Distance Control Between nozzles & Water
- Chemical mixing/Blending to .02 ml accuracy
- Chemical Dispense & Recycling
- Precision wafer speed control from 1 rpm to 6,000 rpm with a repeatability of .2 rpm.
- Multi Su...
Exhausted Workstation (EWS)
JST's Exhausted Workstations are designed for manual processing of 8" wafers or smaller in a class 100 or better environment (read more)
JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products. (read more)
Waste drum cabinets located remotely from the Workstation collects used chemistry for bulk disposal using drums when waste chemistry facility drains are not available. (read more)
- 10 Minute Dry Cycle
- 60 cc IPA per Cycle
- Particle Neutral Drying to 0.16
JST's 100 Ultrasonic Parts Cleaner is self contained, fully automated roll in unit designed for precision parts cleaning. (read more)
Waste drum cabinets located remotely from the Workstation collects used chemistry for bulk disposal using drums when waste chemistry facility drains are not available. (read more)
Whether brush cleaning, ultrasonic cleaning or spray under immersion cleaning, JST can provide equipment that cleans, rinses and dries your products cost effectively. (read more)
JST's linear transfer systems allow for the programming of multiple simultaneous process functions. (read more)
Standard Features:
- Footprint Reduction
- Automatic Process Control
- Increased Maintenance Access
- Reduced Exhaust Required
- Slide out panels for electrical access
- Slide out transfer system for easy maintenance
- Lower slide out drawer for servo motor access
- Removable front panel for easy upgr...
