Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
X-ray diffraction instruments are used to measure crystal structure, grain size, texture and/or residual stress of materials and compounds through interaction of the X-ray beam with a sample.
Print