Plasma treatment equipment and corona treatment equipment generates and exposes organic or polymer substrates to ionized gas to improve wettability of adhesives, paints, inks or other coatings.
Plasma power supplies are DC and RF devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating.
Power supplies are devices that produce AC or DC power. This grouping includes current sources, DC power supplies, AC-DC adapters, DC-DC converters, AC power sources, and DC-AC inverters.
RF generators and high frequency power supplies provide the power required for plasma generation, induction heating, and radar or communications applications.
Signal generators and waveform generators are used to test and align all types of transmitters and receivers, to measure frequency and to generate a signal, waveform or noise source. Signal generators can use AC energy, audio frequency (AF) and radio frequency (RF) to function.
Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
Print