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Technical Articles

An Investigation of Ceria-Based Slurries Exhibiting Reverse-Prestonian Behavior (.pdf) (Industrial Adhesives) New slurry formulations have been developed for polishing oxide in both shallow trench isolation (STI) and inner layer dielectric (ILD) CMP processes. These formulations use cerium oxide as the... (View Full Article)
Ceria Based Slurries for STI and 'Self-Stopping' ILD Polishing: Novel Formulations and Mechanistic Understanding (.pdf) (Industrial Adhesives) In the manufacture of an integrated circuit it is critical to effectively isolate the active areas that form the transistor gates at the device level. The Shallow Trench Isolation (STI) process was... (View Full Article)