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DC power supplies accept an input power and output the desired form of DC power. Common types of DC power supplies include linear power supplies, switching power supplies, DC-DC converters, and silicon controlled rectifier (SCR) type power supplies.
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Electrical feedthroughs transmit electrical current through the walls of a pressurized or vacuum system through a hermetic seal.
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Feedthroughs transmit electrical current, fluids, optical signals, or mechanical motion through the walls of a pressurized or vacuum system through a hermetic seal.
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Fluid feedthroughs use a hermetic seal to transmit fluids through the walls of a pressurized or vacuum system. Devices include nitrogen, air, and water feedthroughs.
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High and ultrahigh vacuum pumps operate efficiently in the high vacuum region and develop molecular flow for highly evacuated systems.
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Impedance matching networks are electrical circuits which, when connected between two networks, match the output impedance of the source (the first network) to the input impedance of the load (the receiving or second network). The purpose of matching these two impedances is to minimize wave reflection and/or to maximize the transfer of power between the system and the load.
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Mechanical feedthroughs transmit mechanical motion through the walls of a vacuum system. Both linear and rotary feedthroughs are included in this grouping.
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Mechanical vacuum pumps and systems contain devices such as pistons, claws, scrolling spirals, and diaphragms to isolate and compress air.
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Optical feedthroughs are used to transfer light into a sealed environment.
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Plasma power supplies are DC and RF devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating.
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Power supplies are devices that produce AC or DC power. This grouping includes current sources, DC power supplies, AC-DC adapters, DC-DC converters, AC power sources, and DC-AC inverters.
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RF generators and high frequency power supplies provide the power required for plasma generation, induction heating, and radar or communications applications.
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Rotary vane vacuum pumps and systems move media through the pump using a rotating assembly in the pumping chamber. Typically, there are two or more rotating vanes that move the media from inlet to outlet. Rotary vane vacuum pumps are positive displacement pumps.
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Specialty or proprietary products and accessories related to vacuum pumps, lines, and processing.
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Specialty vacuum pumps are specialty or proprietary products and accessories related to vacuum pumps.
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Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.
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Thin film sources consist of magnetrons, evaporation thermal units, ion beams and other sources that produce deposition materials (vapors or ions) in a thin film system.
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Vacuum chambers and components are specialized vessels that can maintain a high vacuum process environment for manufacturing thin films, microelectronics, optics and materials.
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Vacuum flanges and fittings connect runs of pipe and tubing in vacuum or process gas system to other tubing sections, pipe, hose, valves, pumps, chambers or other vacuum components.
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Vacuum furnaces are heat-treating furnaces that use a low atmospheric pressure instead of a protective gas atmosphere. This helps to alleviate surface reactions.
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Vacuum gauges are devices for measuring vacuum or sub-atmospheric pressures.
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Vacuum manipulators include components for moving or positioning wafers or items in vacuum chambers or systems such as mounting devices, load locks, wobble sticks or wafer robots.
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Vacuum pumps and vacuum generators provide sub-atmospheric pressure for a variety of industrial and scientific applications where a vacuum is required.
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Vacuum traps, vacuum getters and vacuum filters are used to remove tramp gases with a cooled surface, molecular sieve, filtration, or other processes.
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Vacuum valves are used when a vacuum must be maintained in a closed system.
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Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
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