Wafer and Thin Film Instrumentation from Rigaku Corporation

Process XRR, XRF, and XRD Metrology FAB Tool -- MFM65

Process XRR, XRF, and XRD Metrology FAB Tool -- MFM65 -- View Larger Image
Process XRR, XRF, and XRD Metrology FAB Tool -- MFM65-Image

The Rigaku MFM65 performs high-precision measurements not possible by optical or ultrasonic techniques. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks.

The MFM65 is designed with high-volume 200mm and 300mm manufacturing in mind: high-throughput thickness measurement by XRR and XRF, low-contamination wafer handling and pattern recognition-based position control for product wafer measurements, CE Marking and S2/S8 Compliance for semiconductor production clean room operation, compliance with GEM-300/HSMS and factory automation standards, high-reliability machine performance and low power consumption and cost of ownership.

COLORS™ X-ray optics were developed by Rigaku for the MFM65 to enable measurements from small areas. COLORS beam modules couple a variety of XRF excitation sources with optics and are optimized to provide high brightness in small spots for a variety of thin film applications. With its own x-ray optics business, Rigaku is well-positioned develop and manufacture X-ray sources for current and future market needs.

Product Category
Wafer and Thin Film Instrumentation
Instrumentation Type & Technology
Form Factor
Monitor or instrument
Mounting / Loading
Reflectometer; X-ray Diffractometer; XRR, XRF, XRD

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Applications & Measurements
Wafer / Part Size

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