Precision Oscillating Polishing Machine -- LLCD Optical Polishing Machine
from Lapmaster International

Designated the LLCD series, a typical machine consists of a heavy duty, structural steel base housing a drive system linked to a lapping plate. A polishing pad (type dependent on material to be processed) is bonded directly to the plate. [See More]

  • Applications: Flat Panel Display; MEMS; Optical Coatings; Semiconductors; Magnetic storage
  • Process: Polishing, Lapping, Planarizing
  • Type: Batch
  • Materials Processed: Metal; Silicon; Dielectric or Ceramic; Oxides; Glass Substrates
High Vacuum Experimentation Systems -- UNIVEX 300
from Oerlikon Leybold Vacuum USA Inc.

The UNIVEX multi-purpose experimentation systems were developed by LEYBOLD for applications in research and development, as well as for setting up pilot production systems. The range of applications for these systems covers primarily vacuum coating as well as experiments in vacuum process... [See More]

  • Applications: Flat Panel Display; MEMS; Nanomaterials; Optical Coatings; Research / Surface Analysis; Semiconductors; Cutting tool or other wear components; Tribology, Diffusion, Pilot Trials
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); Electron Beam Evaporation (optional feature); DC_Sputter (optional feature); RF_Sputter (optional feature); Plasma Etching and Cleaning (optional feature); Multiple Processes (optional feature); Rapid Thermal Processing (optional feature); Vacuum Annealing; Vacuum Soldering
  • Type: Batch; Free Standing System
  • Materials Processed: Aluminum; Metal; Silicon; Dielectric or Ceramic; Polymer
Benchtop Plasma Cleaner -- PE-50 XL
from Plasma Etch, Inc.

As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the... [See More]

  • Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
  • Process: Plasma Etching and Cleaning
  • Type: Laboratory or Benchtop
  • Materials Processed: Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
CE-3001
from ULVAC Technologies, Inc.

CE-300I High-Density Plasma Etching System for R &D CE-300I:ISM (Inductively Super Magnetron) is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies. [See More]

  • Applications: MEMS; Research / Surface Analysis; Optical Devices
  • Process: Plasma Etching and Cleaning
  • Type: Free Standing System
  • Wafer / Part Size: 150