MEMS Thin Film Equipment Datasheets

Multi-purpose Vacuum Box Coating Systems -- UNIVEX 400
from Leybold USA Inc.

UNIVEX 400. The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates. In the vacuum chamber which is 420 mm wide, substrates respectively substrate holders up to an... [See More]

  • Applications: MEMS; Optical Coatings; Photovoltaic or solar cell; Semiconductors
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); DC Magnetron Sputtering (optional feature); Ion Beam Assisted Deposition (optional feature)
  • Type: Batch; Free Standing System
  • Materials Processed: Metal; Polymer; Gallium Arsenide or Compound Semiconductors
Benchtop Plasma Cleaner -- PE-50 XL
from Plasma Etch, Inc.

As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the... [See More]

  • Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
  • Process: Plasma Etching and Cleaning
  • Type: Laboratory or Benchtop
  • Materials Processed: Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
CE-3001
from ULVAC Technologies, Inc.

CE-300I High-Density Plasma Etching System for R &D CE-300I:ISM (Inductively Super Magnetron) is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies. [See More]

  • Applications: MEMS; Research / Surface Analysis; Optical Devices
  • Process: Plasma Etching and Cleaning
  • Type: Free Standing System
  • Wafer / Part Size: 150