Carbon Thread Evaporation Device -- LeicaEMCED030
from Leica Microsystems, Inc.

The Leica EM CED030 is a compact bench-top single and multiple carbon thread evaporation device for producing conductive carbon films on specimens for X-ray microanalysis (EDX, WDX) and carbon reinforcement films on collodium or formvar coated specimen support grids for TEM. [See More]

  • Applications: Research / Surface Analysis; Semiconductors
  • Process: Physical Vapor Deposition; Flash Evaporation
  • Type: Laboratory or Benchtop
  • Materials Processed: Carbon Thread
High Vacuum Experimentation Systems -- UNIVEX 300
from Oerlikon Leybold Vacuum USA Inc.

The UNIVEX multi-purpose experimentation systems were developed by LEYBOLD for applications in research and development, as well as for setting up pilot production systems. The range of applications for these systems covers primarily vacuum coating as well as experiments in vacuum process... [See More]

  • Applications: Flat Panel Display; MEMS; Nanomaterials; Optical Coatings; Research / Surface Analysis; Semiconductors; Cutting tool or other wear components; Tribology, Diffusion, Pilot Trials
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); Electron Beam Evaporation (optional feature); DC_Sputter (optional feature); RF_Sputter (optional feature); Plasma Etching and Cleaning (optional feature); Multiple Processes (optional feature); Rapid Thermal Processing (optional feature); Vacuum Annealing; Vacuum Soldering
  • Type: Batch; Free Standing System
  • Materials Processed: Aluminum; Metal; Silicon; Dielectric or Ceramic; Polymer
Temescal -- BCD-2800
from Edwards Vacuum

The newly designed BCD-2800 provides an upgrade and improvement option for customers processing requirements formerly filled by our VES-2550 load lock evaporation system. This mid-sized system offers tooling options that support either lift off or conformal (step coverage) processes, with lift off... [See More]

  • Applications: Research / Surface Analysis
  • Process: Physical Vapor Deposition; Electron Beam Evaporation
  • Type: Batch
  • Materials Processed: Metal
Benchtop Plasma Cleaner -- PE-100
from Plasma Etch, Inc.

The all aluminum chamber features over 240 square inches of active processing surface with the three level standard configuration. The clean design features an industrial powder coated frame to guard your processing environment from contamination. [See More]

  • Applications: Research / Surface Analysis; Printed Circuit Boards
  • Process: Plasma Etching and Cleaning
  • Type: Laboratory or Benchtop
  • Materials Processed: Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
CE-3001
from ULVAC Technologies, Inc.

CE-300I High-Density Plasma Etching System for R &D CE-300I:ISM (Inductively Super Magnetron) is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies. [See More]

  • Applications: MEMS; Research / Surface Analysis; Optical Devices
  • Process: Plasma Etching and Cleaning
  • Type: Free Standing System
  • Wafer / Part Size: 150