Carbon Thread Evaporation Device -- LeicaEMCED030
from Leica Microsystems, Inc.

The Leica EM CED030 is a compact bench-top single and multiple carbon thread evaporation device for producing conductive carbon films on specimens for X-ray microanalysis (EDX, WDX) and carbon reinforcement films on collodium or formvar coated specimen support grids for TEM. [See More]

  • Process: Physical Vapor Deposition; Flash Evaporation
  • Applications: Research / Surface Analysis; Semiconductors
  • Type: Laboratory or Benchtop
  • Materials Processed: Carbon Thread
High Vacuum Experimentation Systems -- UNIVEX 300
from Oerlikon Leybold Vacuum USA Inc.

The UNIVEX multi-purpose experimentation systems were developed by LEYBOLD for applications in research and development, as well as for setting up pilot production systems. The range of applications for these systems covers primarily vacuum coating as well as experiments in vacuum process... [See More]

  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); Electron Beam Evaporation (optional feature); DC_Sputter (optional feature); RF_Sputter (optional feature); Plasma Etching and Cleaning (optional feature); Multiple Processes (optional feature); Rapid Thermal Processing (optional feature); Vacuum Annealing; Vacuum Soldering
  • Applications: Flat Panel Display; MEMS; Nanomaterials; Optical Coatings; Research / Surface Analysis; Semiconductors; Cutting tool or other wear components; Tribology, Diffusion, Pilot Trials
  • Type: Batch; Free Standing System
  • Materials Processed: Aluminum; Metal; Silicon; Dielectric or Ceramic; Polymer
Temescal -- BCD-2800
from Edwards Vacuum

The newly designed BCD-2800 provides an upgrade and improvement option for customers processing requirements formerly filled by our VES-2550 load lock evaporation system. This mid-sized system offers tooling options that support either lift off or conformal (step coverage) processes, with lift off... [See More]

  • Process: Physical Vapor Deposition; Electron Beam Evaporation
  • Applications: Research / Surface Analysis
  • Type: Batch
  • Materials Processed: Metal
Complete Cathode System -- e-Cathode™
from Sputtering Components, Inc.

E-cathode can be equipped with SC, MC, SM, or MM type cathode [See More]

  • Process: Physical Vapor Deposition; RF_Sputter; DC Magnetron Sputtering; DC Pulsed Sputtering; MFAC Sputtering
  • Applications: Flat Panel Display; Optical Coatings; Photovoltaic or solar cell; Semiconductors
  • Type: Laboratory or Benchtop; Complete Cathode System
  • Materials Processed: Aluminum; Tungsten; Metal; Silicon; Dielectric or Ceramic; Oxides; Silicides; Nitrides; TCO
Nanoparticle Deposition System -- FlameBeam
from Tethis S.r.l.

FlameBeam is the Tethis' system for the deposition on nanostructured thin films assembled by nanoparticles produced with the flame spray pyrolysis process. Deposition system is structured in three main stages: the feeding/control stage, the FlameBeam Source (FBS) and the deposition chamber, with its... [See More]

  • Process: Physical Vapor Deposition; Flame Spray Pyrolysis
  • Applications: Nanomaterials; Photovoltaic or solar cell; Medical; Fuel Cell Electrodes, Sorbents
  • Type: Batch (optional feature); Laboratory or Benchtop
  • Materials Processed: Metal; Diamond-like Carbon; Oxides; Nitrides; B, P, Sb, Ga, As or other dopants
CMD Series -- CMD-450BHT
from ULVAC Technologies, Inc.

The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH4 or TEOS. A high-frequency (27.12 MHz) power supply enables high-quality film deposition. [See More]

  • Process: Physical Vapor Deposition; RF_Sputter
  • Applications: Flat Panel Display
  • Type: Cluster Tool
  • Materials Processed: Oxides; Nitrides