from MKS Instruments, Inc.
NOVA ® Series generators offer advancedRF plasma generation and control for low cost and high yield in themost demanding thin film processing applications. The NOVA ® RF Plasma Generators are ideally suited for PlasmaEnhanced Chemical Vapor Deposition (PECVD), High Density Plasma... [See More]
- Application: Plasma; Semiconductor / Thin Film; RF Generator; PECVD, Etch
- Output Power: 2500 to 2.74E7
- Frequency: 1.8 to 2.17
- Adjustability: Frequency