from MKS Instruments, Inc.
NOVA ® Series generators offer advancedRF plasma generation and control for low cost and high yield in themost demanding thin film processing applications. The NOVA ® RF Plasma Generators are ideally suited for PlasmaEnhanced Chemical Vapor Deposition (PECVD), High Density Plasma... [See More]
- Application: Plasma; Semiconductor / Thin Film; RF Generator; PECVD, Etch
- Output Power: 2500 to 2.74E7
- Frequency: 1.8 to 2.17
- Adjustability: Frequency
from ULVAC Technologies, Inc.
13 MHz output, high speed auto-matching, pulse output included [See More]
- Application: High Frequency; Semiconductor / Thin Film; RF Generator
- Style: Rack Mount
- Output Power: 500
- Phase : Three-Phase