Precision Oscillating Polishing Machine -- LLCD Optical Polishing Machine
from Lapmaster International

Designated the LLCD series, a typical machine consists of a heavy duty, structural steel base housing a drive system linked to a lapping plate. A polishing pad (type dependent on material to be processed) is bonded directly to the plate. [See More]

  • Features: Controller; Automated loading or conveyor feeding (optional feature)
  • Process: Polishing, Lapping, Planarizing
  • Type: Batch; Continuous Web or Wire Coater; Inline or Semicontinuous
  • Applications: Flat Panel Display; MEMS; Optical Coatings; Semiconductors; Magnetic storage
High Vacuum Experimentation Systems -- UNIVEX 300
from Oerlikon Leybold Vacuum USA Inc.

The UNIVEX multi-purpose experimentation systems were developed by LEYBOLD for applications in research and development, as well as for setting up pilot production systems. The range of applications for these systems covers primarily vacuum coating as well as experiments in vacuum process... [See More]

  • Features: Controller; Metrology (optional feature); Multiple deposition sources (optional feature); Gas Control; Bell Jar Chamber
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); Electron Beam Evaporation (optional feature); DC_Sputter (optional feature); RF_Sputter (optional feature); Plasma Etching and Cleaning (optional feature); Multiple Processes (optional feature); Rapid Thermal Processing (optional feature); Vacuum Annealing; Vacuum Soldering
  • Type: Batch; Free Standing System
  • Applications: Flat Panel Display; MEMS; Nanomaterials; Optical Coatings; Research / Surface Analysis; Semiconductors; Cutting tool or other wear components; Tribology, Diffusion, Pilot Trials
Benchtop Plasma Cleaner -- PE-50 XL
from Plasma Etch, Inc.

As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the... [See More]

  • Features: Controller; Capacitive Parallel Plate Design
  • Process: Plasma Etching and Cleaning
  • Type: Laboratory or Benchtop
  • Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards