Integral Process Controller? MEMS Processing Equipment Datasheets

Precision Oscillating Head Polishing Machine -- LLCD Optical
from Lapmaster-Wolters International

To complement our extensive range of Single and dual face lapping and polishing machines Lapmaster has introduced a new line of precision oscillating head polishing machines. Designated the LLCD series they are, primarily, Microprocessor controlled pad polishing machines specially designed for... [See More]

  • Features: Controller; Automated loading or conveyor feeding (optional feature)
  • Process: Polishing, Lapping, Planarizing
  • Type: Batch; Continuous Web or Wire Coater; Inline or Semicontinuous
  • Applications: Flat Panel Display; MEMS; Optical Coatings; Semiconductors; Magnetic storage
High Vacuum Experimentation Systems -- UNIVEX 450C Cluster Systems
from Oerlikon Leybold Vacuum USA Inc.

For special applications we can also supply cluster systems based on the UNIVEX concept. These clusters are equipped according to customers requirements and incorporate separate processing and load lock and transfer chambers. [See More]

  • Features: Controller; Metrology (optional feature); Multiple deposition sources (optional feature); Gas Control
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); Electron Beam Evaporation (optional feature); DC_Sputter (optional feature); RF_Sputter (optional feature); Plasma Etching and Cleaning (optional feature); Multiple Processes (optional feature); Rapid Thermal Processing (optional feature); Vacuum Annealing; Vacuum Soldering
  • Type: Free Standing System; Cluster Tool
  • Applications: Flat Panel Display (optional feature); MEMS (optional feature); Optical Coatings (optional feature); Semiconductors (optional feature); Cutting tool or other wear components (optional feature); Magnetic storage (optional feature); Customer Specific
Benchtop Plasma Cleaner -- PE-50 XL
from Plasma Etch, Inc.

As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the... [See More]

  • Features: Controller; Capacitive Parallel Plate Design
  • Process: Plasma Etching and Cleaning
  • Type: Laboratory or Benchtop
  • Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards