Cluster Tool (Multi-Chamber / Single Wafer) MEMS Processing Equipment Datasheets

High Vacuum Experimentation Systems -- UNIVEX 450C Cluster Systems
from Leybold USA Inc.

For special applications we can also supply cluster systems based on the UNIVEX concept. These clusters are equipped according to customers requirements and incorporate separate processing and load lock and transfer chambers. [See More]

  • Type: Free Standing System; Cluster Tool
  • Applications: Flat Panel Display (optional feature); MEMS (optional feature); Optical Coatings (optional feature); Semiconductors (optional feature); Cutting tool or other wear components (optional feature); Magnetic storage (optional feature); Customer Specific
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); Electron Beam Evaporation (optional feature); DC_Sputter (optional feature); RF_Sputter (optional feature); Plasma Etching and Cleaning (optional feature); Multiple Processes (optional feature); Rapid Thermal Processing (optional feature); Vacuum Annealing; Vacuum Soldering
  • Materials Processed: Aluminum; Metal; Silicon; Dielectric or Ceramic; Polymer
from ULVAC Technologies, Inc.

This system incorporated technology of high-speed silicon etching. The model range are available from prototypes for R &D to multi-chamber types for mass-production. [See More]

  • Type: Batch (optional feature); Cluster Tool (optional feature)
  • Applications: MEMS; Research / Surface Analysis; Semiconductors
  • Process: Plasma Etching and Cleaning
  • Wafer / Part Size: 200