Aleris Family -- 8330
from KLA-Tencor Corporation

The Aleris Family of film metrology tools provides reliable and precise measurement of film thickness, refractive index, stress and composition for the 32nm node and beyond. Utilizing Broadband Spectroscopic Ellipsometry (BBSE) technology, the Aleris systems form a comprehensive metrology solution,... [See More]

  • Measurements: Composition (optional feature); FilmThickness; Refractive Index
  • Mounting / Loading: Floor
  • Form Factor: Monitor or instrument
  • Technology: Reflectometer
In-line, Simultaneous WDXRF Spectrometer -- WaferX 300
from Rigaku Corporation

Rigaku's WaferX 300 represents the culmination of 25 years of experience in the X-ray fluorescence analysis of thin films on silicon wafers. Specifically developed as an in-process metrology tool, the system incorporates "bridge tool" technology — servicing 6", 8", as well as the latest 12"... [See More]

  • Measurements: Composition; FilmThickness
  • Mounting / Loading: Floor
  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); WDXRF
EDXRF Analyzer -- EX-6600 SDD
from Xenemetrix Ltd.

EX-6600 SDD. Secondary Target EDXRF. Xenemetrix ’s EX-6600 SDD Energy Dispersive X-ray Fluorescence (EDXRF) spectrometer offers the ultimate in sensitivity and selectivity. The Silicon Drift Detector (SDD) simultaneously delivers lower electronic noise and higher count rates which translates... [See More]

  • Measurements: Composition
  • Mounting / Loading: Manual loading; Floor
  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF