Thin Film Monitors -- PV-1000
from MTI Instruments Inc.

Using MTII ’s exclusive Push/Pull capacitance probe technology, each PV-1000 module provides up to three pairs of probes for measurement of maximum, minimum and average thickness, as well as total thickness variation (TTV) and wafer bow. For applications requiring additional thickness... [See More]

  • Measurements: Deposition rate (optional feature); Dopant or carrier concentration (resistivity) (optional feature); Flatness; CMP, etching, process gas or plasma diagnostics; FilmThickness (optional feature); Roughness / Waviness; Microstructure or crystal structure; WaferThickness; Area mapping
  • Mounting / Loading: In-line; Manual loading; Floor
  • Form Factor: Controller; Sensor or sensing element
  • Technology: Capacitance or electromagnetic gage
Mass and Energy Analyzer -- EQP
from Hiden Analytical

The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes. [See More]

  • Measurements: Deposition rate; CMP, etching, process gas or plasma diagnostics
  • Mounting / Loading: In-process, in-situ or system mounted
  • Form Factor: Monitor or instrument; Controller
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
MerMaid
from Imego

MERMAID is a unique measurement instrument for analysis of liquid and thin film properties using magnetoelastic resonance (MER) sensors. Dynamic events such as viscosity change, phase transitions or bio film growth can be analyzed. The MER sensor can measure properties of either a coating on top of... [See More]

  • Measurements: Deposition rate; CMP, etching, process gas or plasma diagnostics; FilmThickness; Curing Rate
  • Mounting / Loading: In-process, in-situ or system mounted; Floor
  • Form Factor: ProbingSystem; Sensor or sensing element
  • Technology: Quartz crystal microbalance; Magnetoelastic Resonance Sensors (MER)
PlasmaVolt X2
from KLA-Tencor Corporation

The PlasmaVolt ™ X2 measures plasma etch chamber conditions in semiconductor wafer processing systems. With an increased number of embedded sensors and improved spatial resolution, the PlasmaVolt X2 is highly sensitive to changes in various parameters such as radio frequency (RF) power, gas... [See More]

  • Measurements: CMP, etching, process gas or plasma diagnostics
  • Mounting / Loading: In-process, in-situ or system mounted
  • Form Factor: Sensor or sensing element
  • Technology: 14-Point RF Measurement Wafer
CRTM Series -- CRTM-6000
from ULVAC Technologies, Inc.

High resolution, high speed sampling, long life span [See More]

  • Measurements: Deposition rate; CMP, etching, process gas or plasma diagnostics; FilmThickness
  • Mounting / Loading: In-process, in-situ or system mounted
  • Form Factor: Monitor or instrument; Controller
  • Technology: Quartz crystal microbalance