from KLA-Tencor Corporation

The ASET-F5x thin film metrology system can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm —a critical feature for meeting the stringent thin film measurement requirements down to 0.1 micron geometries. Accurate measurements of complex multi-layer thin film... [See More]

  • Technology: Ellipsometer
  • Mounting / Loading: Floor
  • Form Factor: ProbingSystem
  • Applications: Wafer; CVD / PVD; Polishing / CMP; Photolithography; Etching
ESM Series -- 1T/1AT
from ULVAC Technologies, Inc.

Provides a broad range of specs suitable for various R & D applications [See More]

  • Technology: Ellipsometer
  • Mounting / Loading: In-process, in-situ or system mounted
  • Form Factor: Monitor or instrument
  • Applications: Wafer; CVD / PVD