from LOT Vacuum America
LD Series pumps are designed to sip electricity and back turbo pumps. LD pumps are an excellent choice for entry and exit load locks, PVD Turbos, evaporation chambers, and transfer chambers. LD pumps incorporate the same state-of-the-art energy and communication features as the HD series. [See More]
- Application: Industrial; Scientific; Semiconductor
- Pumping Speed: 530
- Configuration: Individual Vacuum Pump
- Ultimate Vacuum: ? to 5.00E-4
from Oerlikon Leybold Vacuum USA Inc.
Increasing environmental awareness, pumping of condensable vapors or highrequirements regarding cleanness when pumping high-quality media whichmust not be contaminated by other media for recycling, often requiresthe use of universal pumps where the pump chamber is free of operatingagents (dry... [See More]
- Application: Industrial; Chemical; Semiconductor; Refinement, Metallurgy, Drying
- Pumping Speed: 2660
- Configuration: Vacuum Pump System or Station
- Ultimate Vacuum: 7.50E-4
from SynSysCo
ISP- 90. Air Cooled, Oil-Free Performance. The Anest Iwata oil-free ISP scroll vacuum pump is "The Original. ". Anest Iwata was the first manufacturer to bring scroll vacuum pumps to the vacuum market. With over 10 years of field experience and more performance hours than all its competitors... [See More]
- Application: Industrial; Scientific; Packaging; Semiconductor; Sputtering Systems, Vacuum Deposition, Ion Plating, Accelerator and Synchrotron Radiation, Helium Leak Detection Systems, Gas Recovery Equipment
- Pumping Speed: 3.2 to 3.8
- Configuration: Individual Vacuum Pump
- Ultimate Vacuum: 0.0380
from VACUUBRAND, Inc.
Chemistry-design diaphragm pumps are an excellent solution for continuous, oil-free pumping of corrosive gases and vapors. The one-stage construction provides the advantageous combination of high pumping speed and ultimate vacuum down to 70 mbar. All major parts in contact with pumped media are made... [See More]
- Application: Industrial; Scientific; Chemical; Medical / Laboratory; Packaging; Pharm/Sanitary; Semiconductor
- Pumping Speed: 2.53
- Configuration: Individual Vacuum Pump
- Ultimate Vacuum: 52.52
from Adixen
The ACP series design incorporates the Adixen multi-stage Roots pumping concept, extensively field proven. The pumping module of ACP series pumps is optimized for operation without internal lubricant and seals. ACP series 2 range consists in ACP15, ACP28 and ACP40 models. Pumping speed range : 15,... [See More]
- Application: Industrial; Manufacturing; Semiconductor; Etch, Stripping, Ashing
- Pumping Speed: 55.8
- Configuration: Individual Vacuum Pump
- Ultimate Vacuum: 0.0050
from Busch LLC
Compact, simple design for easy installation and low maintenance, quiet [See More]
- Application: Industrial; Food; Manufacturing; Medical / Laboratory; Packaging; Pharm/Sanitary; Semiconductor
- Pumping Speed: 4.2
- Configuration: Individual Vacuum Pump; Vacuum Pump System or Station (optional feature)
- Ultimate Vacuum: 0.5000
from EBARA Technologies, Inc.
The EST Series consists of a two-stage screw design main pump engineered for application in harsh duty processes. The main pump is packaged with a lobe style booster pump for increased pumping speed. The EST Series covers a wide pumping speed range from 88 to 1765 CFM. EST pumps are designed and... [See More]
- Application: Industrial; Semiconductor
- Lubrication Style: Dry or Oil-less
- Configuration: Individual Vacuum Pump
- Pump Stages: Two Stage
from Travaini Pumps USA
Travaini high efficiency liquid ring vacuum pump, monoblock design. Heavy duty flexible coupling, no field alignment or lubrication required. NEMA C-face TEFC, motor, 3 phase 60 hz, 230/460 volt, class F, 1.15 service factor. Separator reservoir with level gauge, temperature & pressure gauge and... [See More]
- Application: Industrial; Chemical; Food; Pharm/Sanitary; Semiconductor; Environmental, Electronics, Petroleum
- Pumping Speed: 15
- Configuration: Vacuum Pump System or Station
- Ultimate Vacuum: 23.4 to 379
from ULVAC Technologies, Inc.
The ER Series is the latest addition to ULVAC's PDR-C Series, popular for SiN-LPCVD, metal etching and other harsh processes generating sublimated substances. The ER Series is for process applications such as sputter, ashing, and etching requiring corrosion resistance. The ER Series are the most... [See More]
- Application: Industrial; Chemical; Semiconductor
- Pumping Speed: 670
- Configuration: Individual Vacuum Pump
- Ultimate Vacuum: 0.0050
