Tantalum Sputtering Targets
from H.C. Starck Inc. - Fabricated Products Group

H.C. Starck is a major international producer of tantalum products for the electronic, semiconductor and industrial markets. Tantalum ingots are electron beam (EB) melted, and have inherently high purity due to a combination of high vacuum settings, slow melting rates, multiple furnance passes, and... [See More]

  • Applications: Flat Panel Display; Optical Coatings; Semiconductors; Magnetic storage
  • Material: Carbide; Tantalum
  • Type: Sputtering Target; Planar
  • Purity: 99.95 to 99.98
High Density Ceramic TCO Sputtering Target Indiun Tin Oxide (ITO)
from Umicore Materials

For deposition of transparent conductive oxide layers. Rotary ceramic sintered ITO targets for display applications. ITO sputtering targets allow deposition of high quality transparent conductive thin films and are manufactured from selected raw materials with high chemical purity resulting in... [See More]

  • Applications: Flat Panel Display
  • Material Density: 7.14
  • Type: Sputtering Target
  • Width / OD: 375