Tantalum Sputtering Targets
from H.C. Starck Inc. - Fabricated Products Group

H.C. Starck is a major international producer of tantalum products for the electronic, semiconductor and industrial markets. Tantalum ingots are electron beam (EB) melted, and have inherently high purity due to a combination of high vacuum settings, slow melting rates, multiple furnance passes, and... [See More]

  • Applications: Flat Panel Display; Optical Coatings; Semiconductors; Magnetic storage
  • Material: Carbide; Tantalum
  • Type: Sputtering Target; Planar
  • Purity: 99.95 to 99.98
Hexoloy SG DC Magnetron Sputtering
from Saint-Gobain Ceramics - Hexoloy® Products

Hexoloy SG, a variant of silicon carbide containing graphitic carbon, is electrically conductive and can be readily DC magnetron sputtered. Silicon carbide thin film coatings are optically transparent, abrasion and corrosion resistant, temperature stable, and have excellent adhesion on a variety of... [See More]

  • Applications: Decorative / Shielding; Optical Coatings; Magnetic storage; Vapor Barrier
  • Material: Hexoloy
  • Type: Sputtering Target
  • Resistivity: 1
Target Design for Magnetic Materials
from Umicore Materials

Magnetic materials like Ni, Fe and their alloys are difficult to sputter using traditional magnetrons. These materials absorb and disturb the magnetic field of the magnetron resulting in poor sputtering rate and bad film homogeneity. Umicore has developed special target designs to cope with this... [See More]

  • Applications: Magnetic storage
  • Material: Ni, Fe
  • Type: Sputtering Target; Planar; Target Diffusion, Solder or Other Bonding to Backing Plate