In-Line Spectroscopic Ellipsometer -- UVISEL
from HORIBA Scientific

In-Line Spectroscopic Ellipsometer for Web Coater and Roll to Roll Systems. The UVISEL Spectroscopic Phase Modulated Ellipsometer is a turn-key thin film metrology instrument for in-line measurement of thin film thickness and optical properties. It features rapid measurement capability with data... [See More]

  • Measurements: FilmThickness
  • Technology: Ellipsometer; Spectrometer (SIMS, XRF, FTIR, DLTS, AAS)
  • Mounting / Loading: Floor
  • Applications: Wafer; CVD / PVD
Thin-Film Measuring Systems -- TF Series
from StellarNet, Inc.

TF Systems for Non-Contact Film Thickness Measurements. We offer a complete line of film thickness measurement systems that can measure from 5 nm to 200 ┬Ám for analysis of single layer and/or multilayer films in less than a second. StellarNet thin film reflectometry systems consist of a portable USB... [See More]

  • Measurements: FilmThickness (optional feature); WaferThickness (optional feature)
  • Technology: Reflectometer
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer (optional feature); Memory drive disc or head (optional feature); CVD / PVD (optional feature); Flat panel display (optional feature); Optical components or lenses (optional feature); Polishing / CMP (optional feature); Polymer or photoresist films (optional feature); Thin-Film Photovoltaics
Thin Film Deposition Monitor -- F30 Series
from Filmetrics, Inc.

The Most Powerful Tool Available for Monitoring Thin-Film Deposition. Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system. Example Layers. MBE and MOCVD: Smooth and... [See More]

  • Measurements: Deposition rate; Optical constants (n or k); FilmThickness
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Mounting / Loading: In-line
  • Applications: Wafer; CVD / PVD
Aleris Family -- 8330
from KLA-Tencor Corporation

The Aleris Family of film metrology tools provides reliable and precise measurement of film thickness, refractive index, stress and composition for the 32nm node and beyond. Utilizing Broadband Spectroscopic Ellipsometry (BBSE) technology, the Aleris systems form a comprehensive metrology solution,... [See More]

  • Measurements: Composition (optional feature); FilmThickness; Refractive Index
  • Technology: Reflectometer
  • Mounting / Loading: Floor
  • Applications: CVD / PVD
CRTM Series -- CRTM-6000
from ULVAC Technologies, Inc.

High resolution, high speed sampling, long life span [See More]

  • Measurements: Deposition rate; CMP, etching, process gas or plasma diagnostics; FilmThickness
  • Technology: Quartz crystal microbalance
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD; Flat panel display; Optical components or lenses
Laser Scanning Confocal Microscope -- LSCM
from WDI Wise Device Inc.

The LSCM has the advantages of a confocal laser scanning microscope with the size and price of an IR camera. The combination of high contrast imaging, infrared capabilities, extremely small size and low cost enables many new applications. [See More]

  • Measurements: Defects, dimples or film residues; FilmThickness; Area mapping; Mask Alignment
  • Technology: Optical / Imaging
  • Mounting / Loading: In-process, in-situ or system mounted
  • Applications: Wafer; CVD / PVD; Flat panel display; Packaged IC or substrate; Optical components or lenses; Photolithography
Metrology System -- Z3D-7000 Series
from Zygo Corporation

Simultaneously measures multiple parameters [See More]

  • Measurements: Critical dimensions or Trench geometry; FilmThickness; Roughness / Waviness; Area mapping; DepthProfiling; 3D Surface Metrology
  • Technology: Profilometer or AFM; Optical / Imaging; Interferometer
  • Mounting / Loading: In-line; Floor
  • Applications: Wafer; CVD / PVD; Electroplate; Polishing / CMP; Photolithography; Etching; Bumping Processes