Thin-Film Measuring Systems -- TF Series
from StellarNet, Inc.
from StellarNet, Inc.
TF Systems for Non-Contact Film Thickness Measurements. We offer a complete line of film thickness measurement systems that can measure from 5 nm to 200 µm for analysis of single layer and/or multilayer films in less than a second. StellarNet thin film reflectometry systems consist of a portable USB... [See More]
- Applications: Wafer (optional feature); CVD / PVD (optional feature); Polishing / CMP (optional feature); Polymer or photoresist films (optional feature); Thin-Film Photovoltaics
- Technology: Reflectometer
- Form Factor: Monitor or instrument
- Measurements: FilmThickness (optional feature); WaferThickness (optional feature)
ASET-F5x
from KLA-Tencor Corporation
from KLA-Tencor Corporation
The ASET-F5x thin film metrology system can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm —a critical feature for meeting the stringent thin film measurement requirements down to 0.1 micron geometries. Accurate measurements of complex multi-layer thin film... [See More]
- Applications: Wafer; CVD / PVD; Polishing / CMP; Photolithography
- Mounting / Loading: Floor
- Form Factor: ProbingSystem
- Technology: Ellipsometer
Metrology System -- Z3D-7000 Series
from Zygo Corporation
from Zygo Corporation
Simultaneously measures multiple parameters [See More]
- Applications: Wafer; CVD / PVD; Electroplate; Polishing / CMP; Photolithography; Bumping Processes
- Mounting / Loading: In-line; Floor
- Form Factor: Monitor or instrument
- Technology: Profilometer or AFM; Optical / Imaging; Interferometer