Semiconductor Metrology Instruments - Spectral Interference Laser Displacement Meter -- SI-F01
from KEYENCE

SI-F Series Spectral Interference Displacement Meter. The SI-F Series Spectral Interference Displacement Meter specializes in super-high accuracy displacement measurement for thickness or position measurement or surface mapping. With resolution down to 1nm, the SI Series is able to see even the... [See More]

  • Form Factor: Monitor or instrument; Controller; Sensor or sensing element
  • Technology: Interferometer
  • Mounting / Loading: In-line; Floor
  • Applications: Wafer; Packaged IC or substrate
Polar Kerr System for MRAM
from MicroSense, LLC

The Polar Kerr System for MRAM utilizes the polar Magneto-Optical Kerr Effect (MOKE) to characterize the magnetic properties of multi-layer wafers used in the development and manufacturing of perpendicular MRAM. Utilizing a non-contact full-wafer measurement technique, the system creates a map of... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Magnetometer
  • Mounting / Loading: Floor
  • Applications: Wafer
Thin-Film Measuring Systems -- TF Series
from StellarNet, Inc.

TF Systems for Non-Contact Film Thickness Measurements. We offer a complete line of film thickness measurement systems that can measure from 5 nm to 200 ┬Ám for analysis of single layer and/or multilayer films in less than a second. StellarNet thin film reflectometry systems consist of a portable USB... [See More]

  • Form Factor: Monitor or instrument
  • Applications: Wafer (optional feature); CVD / PVD (optional feature); Polishing / CMP (optional feature); Polymer or photoresist films (optional feature); Thin-Film Photovoltaics
  • Technology: Reflectometer
  • Measurements: FilmThickness (optional feature); WaferThickness (optional feature)
Tropel® FlatMaster® -- FlatMaster® Wafer
from Corning Specialty Materials

Ideal for processes development, particularly for new, non-silicon material [See More]

  • Form Factor: Monitor or instrument
  • Technology: Interferometer
  • Mounting / Loading: Floor
  • Applications: Wafer
Automated Cassette-to-Cassette Thin Film Thickness Mapping System -- F60-c Series
from Filmetrics, Inc.

Automated Cassette-to-Cassette Thin-Film Thickness Mapping System for Production Environments. The Filmetrics F60-c family maps film thickness and index just like our F50 products, but it also includes a number of features intended specifically for production environments. These include automatic... [See More]

  • Form Factor: Monitor or instrument
  • Applications: Wafer; CVD / PVD
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
  • Measurements: Area mapping
300 UV Series
from KLA-Tencor Corporation

The KLA-Tencor 300 UV Series was the first reticle inspection family using UV illumination for the inspection of DUV reticles. With the higher resolution UV wavelength and new defect detection technology, the 300UV reticle inspection systems can inspect reticles with advanced design rules, critical... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Optical / Imaging; UV Inspection
  • Mounting / Loading: Floor
  • Applications: Photolithography
Wafer Inspection System -- MX51
from Olympus America Inc.

The Olympus MX51 industrial inspection microscope is optimized for the inspection requirements of a variety of electronic components including semiconductor wafer inspection. Its compact size, ease of operation, 6"x6" stage travel and cost effectiveness make the MX51 an ideal inspection microscope... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Optical / Imaging
  • Mounting / Loading: In-line (optional feature); Manual loading
  • Applications: Wafer
XE-3DM
from Park Systems, Inc.

Park Systems has revolutionized the AFM with the introduction of the XE-3DM, the fully automated AFM system designed for overhang and trench profiles, sidewall roughness and imaging, and critical angle measurements. The unique design of the XE-3DM, made possible by the XE-series ’ decoupled XY... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Profilometer or AFM
  • Mounting / Loading: Floor
  • Applications: Wafer
In-line, Simultaneous WDXRF Spectrometer -- WaferX 300
from Rigaku Corporation

Rigaku's WaferX 300 represents the culmination of 25 years of experience in the X-ray fluorescence analysis of thin films on silicon wafers. Specifically developed as an in-process metrology tool, the system incorporates "bridge tool" technology — servicing 6", 8", as well as the latest 12"... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); WDXRF
  • Mounting / Loading: Floor
  • Applications: Wafer
Laser Diode Bar Tester
from TELOPS, Inc.

The laser diode bar tester picks up each laser diode bar from the tape and measures LIV, wavelength and FFP characteristics for each die. [See More]

  • Form Factor: Monitor or instrument; ProbingSystem
  • Technology: Optical / Imaging; IV system or SMU; Wafer sorter or prober
  • Mounting / Loading: Floor
  • Applications: Packaged IC or substrate; Laser Diode Bar Tester
CRTM Series -- CRTM-6000
from ULVAC Technologies, Inc.

High resolution, high speed sampling, long life span [See More]

  • Form Factor: Monitor or instrument; Controller
  • Measurements: FilmThickness
  • Applications: Wafer; CVD / PVD
  • Features: Noncontact; Non-destructive
Laser Machining Microscope -- MIC4
from WDI Wise Device Inc.

This is the only commercially available microscope guaranteeing transmission of more then 80% for all four YAG laser harmonics: 266, 355, 532, and 1064nm - without compromising the review channel fidelity. The MIC4 microscope is instrumental in laser repair of TFT arrays over the wavelength ranging... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Optical / Imaging
  • Mounting / Loading: Floor (optional feature)
  • Applications: CVD / PVD; Electroplate; Packaged IC or substrate; Photolithography; PV Cell, Laser Micromachining, Photomask
EDXRF Analyzer -- EX-6600 SDD
from Xenemetrix Ltd.

EX-6600 SDD. Secondary Target EDXRF. Xenemetrix ’s EX-6600 SDD Energy Dispersive X-ray Fluorescence (EDXRF) spectrometer offers the ultimate in sensitivity and selectivity. The Silicon Drift Detector (SDD) simultaneously delivers lower electronic noise and higher count rates which translates... [See More]

  • Form Factor: Monitor or instrument
  • Technology: Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); EDXRF
  • Mounting / Loading: Manual loading; Floor
  • Applications: Wafer; CVD / PVD; Electroplate
Metrology System -- Z3D-7000 Series
from Zygo Corporation

Simultaneously measures multiple parameters [See More]

  • Form Factor: Monitor or instrument
  • Technology: Profilometer or AFM; Optical / Imaging; Interferometer
  • Mounting / Loading: In-line; Floor
  • Applications: Wafer; CVD / PVD; Electroplate; Polishing / CMP; Photolithography; Bumping Processes