Cerium Oxide
from Ferro Corporation-Electronic Material Systems

Offer a range of purities, average particle size can be smaller than 100nm [See More]

  • Compound / Abrasive Type: Cerium Oxide
  • Form: Powder
  • Type: CMP / Wafer Planarization; Polishing
  • Materials / Substrates Finished: CeramicsGlass; Ophthalmic or Optical; Wafers, Electronic, and Semiconductor Materials
Nanoceria Polishing Particles -- 9282 - 100NM
from Saint-Gobain Surface Conditioning Group

Saint-Gobain's Nanoceria Polishing Particles are unique, patent-pending cerium oxide particles intended for polishing applications where ultrafine finishes are desired. The particles are well dispersed at all pHs and can be custom engineered to suit your particular slurry formulation or product... [See More]

  • Compound / Abrasive Type: Cerium Oxide
  • Form: Powder
  • Type: Polishing
  • Grading System: Micron Graded