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  • Cavitation Erosion of a Zirconium Pump Impeller in an Aqueous Hydrochloric Acid Service Environment (.pdf)
    Remnants of two zirconium impellers were submitted to IMR Test Labs (a division of Ithaca Materials Research) for post-service materials analysis. Both impellers were utilized in chemical industry circulation pump applications in the Mid-East.
  • Evaluating the performance of dual PTFE filter assemblies in hot-acid etch baths
    or etching speed is regulated by the bath temperature. A Model SMS 178-02 hot-acid cabinet (SubMicron Systems, Allentown, PA) equipped with an all-fluorocarbon pump (Iwaki Walchem, Holliston, MA) was used for these studies. The cabinet was piped with 3/4-in. PFA tubing
  • MICRO:Product Technology News (Sept. '98 p.60)
    . Featuring advanced automation capability, the implanters are designed to meet the need for increased yields and reduced die costs. The oil-free, piston-operated EcoDry L pump minimizes hydrocarbon contamination. The pump incorporates permanently lubricated and sealed bearings placed outside the vacuum
  • MICRO: Critical Materials?Chemicals
    condition in a 20-wafer-per-hour process can cause an IC manufacturer processing wafers valued at $2500 each to lose $1,200,000 per day in revenues. Abnormal flow conditions can have a variety of causes, including pump, filter, and valve or valve control issues; facilities difficulties; or human
  • Contamination: hydraulic system enemy no. 1
    it. These measures are important because water breaks down oil-additive packages, forms acids that corrode metal surfaces and, in mineral-based oils, supports oxidation. SKF, the Swedish bearing manufacturer, says hydraulic oil containing just 0.1% water by volume cuts bearing life in half, while 1
  • MICRO:Top 40 Product Allstars (Nov/Dec '98)
    . The system can be incorporated into polishing systems made by OEMs such as Applied Materials, Ebara, IPEC/Planar, Speedfam, and Strasbaugh. The Point Source scrubber removes virtually all inorganic contaminants at an efficiency rate of 99.5%. The system can be used for hydrochloric acid, hydrogen

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