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  • MICRO:Facilities Technologies by Oleg P. Kishkovich p.61 (June '99)
    ppb; the ammonia concentration in human exhalation exceeds 100 ppb for nonsmokers and 1000 ppb for smokers; and the ammonia in body odor may exceed 100 ppb. Thus, air quality monitoring in the semiconductor industry is essential to protect the DUV process from molecular base contamination
  • MICRO:Top 40 Product Allstars (Nov/Dec '98)
    the throughput of the previous model, the NovaScan 420 integrated thickness monitor permits wafer metrology and mapping operations during chemical mechanical planarization. The system gives operators rapid feedback during the CMP process, offering the accuracy and resolution of stand-alone monitors
  • Advanced Oxidation Ditch Performance (.pdf)
    removal efficiency. High influent flow rates and high influent ammonia-N levels during the off cycle will adversely affect performance and result in lower nitrogen removal efficiency. If the operators decide not to use ORP probes to monitor performance, on-off operation can still be used. A trial

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