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  • Measuring anions and ammonium in bases and acids with ion chromatography (Second in a series)
    of ammonium ions was only about 50%. In addition, the neutralizer unit could not be used with hydrochloric acid because chloride can be oxidized on the electrode surface, leading to the destruction of the neutralizer. This
  • Detection of the Peroxide Explosives TATP and HMTD
    tubes in the DART ion source. Dilute aqueous ammonium hydroxide on a cotton swab was held in the DART gas stream to enhance detection of TATP as the ammoniated molecule. TATP is readily detected as [M+NH4]+ at m/z 240.1447 (Figure 1). A trace fragment at m/z 91.0399 is assigned as the C3H7O3 + fragment.
  • Measuring trace ionic impurities in ultrapure acids and bases with ion chromatography (Third in a series)
    of such a system to the analysis of parts-per-billion levels of anionic impurities in 49% hydrofluoric acid (HF), 30% ammonium hydroxide (NH OH), and 25% trimethylammonium hydroxide (TMAOH) and ammonium (NH ) in 98% sulfuric acid (H ), and 37% hydrochloric acid (HCl) has been demonstrated. The study
  • MICRO: Ultrapure Fluid/Slurry Delivery- McMillan (January 2001)
    other such facilities, Fab 25 has numerous chemical- mechanical planarization (CMP) tools, each of which uses a system of peristaltic pumps for process fluid delivery. At various times during each CMP process, these pumps may be delivering tungsten or oxide slurries, DI water, or ammonium hydroxide
  • MICRO: Ultrapure Fluids - Winters (April 2000)
    (SC) chemical mixtures. The SC-1 chemistry consists of ammonium hydroxide, hydrogen peroxide, and ultrapure water (UPW), while SC-2 consists of hydrochloric acid, hydrogen peroxide, and UPW. The wafers are also rinsed with UPW following both the SC-1 and SC-2 cleaning steps. The optimization
  • MICRO: Surface Conditioning - Hakanson (March 2000)
    Andy Hakanson and Narendra Garg, ; and Michael R. Borden and Harlan F. Chung, Cleaning processes for removing chemical-mechanical polishing (CMP) residues rely on double-sided brush scrubbers and the use of harsh chemistries (typically ammonium hydroxide and hydrogen peroxide). Unfortunately
  • Care & Use Of Acrylic (.pdf)
    by tests made under actual working conditions. Chemical. Code Chemical. Code. Acetic Acid (5%). LR. Hydrogen Peroxide (3%). R. Acetic Acid (Glacial). N. Hydrogen Peroxide (28%). LR. Acetone. N. Isopropyl Alcohol (30%). LR. Ammonium Chloride. R. Kerosene. R. Ammonium Hydroxide (10%). R. Lacquer Thinner. N
  • Optical Liquid Level Sensor Application Note (.pdf)
    . Acetic acid - Glacial. Glycerol. Acetic acid - 10%. Heptane. Ammonia - 88. Hydrochloric acid 10%. Ammonium Hydroxide - 10%. Hydrochloric acid conc. Ammonium Chloride - 10%. Hydrogen Peroxide. Aviation spirit. Isopropanol. Benzene. Iso-Octane. Benzoic acid. Kerosene. Bleach. Linseed oil. Brine