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  • Measuring anions and ammonium in bases and acids with ion chromatography (Second in a series)
    of ammonium ions was only about 50%. In addition, the neutralizer unit could not be used with hydrochloric acid because chloride can be oxidized on the electrode surface, leading to the destruction of the neutralizer. This
  • Detection of the Peroxide Explosives TATP and HMTD
    tubes in the DART ion source. Dilute aqueous ammonium hydroxide on a cotton swab was held in the DART gas stream to enhance detection of TATP as the ammoniated molecule. TATP is readily detected as [M+NH4]+ at m/z 240.1447 (Figure 1). A trace fragment at m/z 91.0399 is assigned as the C3H7O3 + fragment.
  • Measuring trace ionic impurities in ultrapure acids and bases with ion chromatography (Third in a series)
    of such a system to the analysis of parts-per-billion levels of anionic impurities in 49% hydrofluoric acid (HF), 30% ammonium hydroxide (NH OH), and 25% trimethylammonium hydroxide (TMAOH) and ammonium (NH ) in 98% sulfuric acid (H ), and 37% hydrochloric acid (HCl) has been demonstrated. The study
  • MICRO: Ultrapure Fluid/Slurry Delivery- McMillan (January 2001)
    other such facilities, Fab 25 has numerous chemical- mechanical planarization (CMP) tools, each of which uses a system of peristaltic pumps for process fluid delivery. At various times during each CMP process, these pumps may be delivering tungsten or oxide slurries, DI water, or ammonium hydroxide
  • MICRO: Surface Conditioning - Hakanson (March 2000)
    Andy Hakanson and Narendra Garg, ; and Michael R. Borden and Harlan F. Chung, Cleaning processes for removing chemical-mechanical polishing (CMP) residues rely on double-sided brush scrubbers and the use of harsh chemistries (typically ammonium hydroxide and hydrogen peroxide). Unfortunately
  • MICRO: Ultrapure Fluids - Winters (April 2000)
    (SC) chemical mixtures. The SC-1 chemistry consists of ammonium hydroxide, hydrogen peroxide, and ultrapure water (UPW), while SC-2 consists of hydrochloric acid, hydrogen peroxide, and UPW. The wafers are also rinsed with UPW following both the SC-1 and SC-2 cleaning steps. The optimization
  • Care & Use Of Acrylic (.pdf)
    by tests made under actual working conditions. Chemical. Code Chemical. Code. Acetic Acid (5%). LR. Hydrogen Peroxide (3%). R. Acetic Acid (Glacial). N. Hydrogen Peroxide (28%). LR. Acetone. N. Isopropyl Alcohol (30%). LR. Ammonium Chloride. R. Kerosene. R. Ammonium Hydroxide (10%). R. Lacquer Thinner. N
  • Optical Liquid Level Sensor Application Note (.pdf)
    . Acetic acid - Glacial. Glycerol. Acetic acid - 10%. Heptane. Ammonia - 88. Hydrochloric acid 10%. Ammonium Hydroxide - 10%. Hydrochloric acid conc. Ammonium Chloride - 10%. Hydrogen Peroxide. Aviation spirit. Isopropanol. Benzene. Iso-Octane. Benzoic acid. Kerosene. Bleach. Linseed oil. Brine
  • Chemical Compatibility Chart for General Laboratory Filtration Products (.pdf)
    . Ammonium Hydroxide, 6N. R. N. R. N. N. N. R. L. R. R. R. R. e. s. Potassium Hydroxide, 6N. R. N. N. N. R. N. T. N. R. R. R. -. Ba. Sodium Hydroxide, 6N. R. N. T. N. N. N. R. L. R. R. R. R. Acetone. R. N. N. N. R. L. N. R. R. R. R. R. Acetonitrile. T. N. R. N. R. L. R. R. R. R. R. R. Amyl Acetate
  • Urethane Interior Coating Chemical Resistance Chart
    F. YES. YES. NO. Alums. Sat'd. 75 F. YES. YES. NO. Ammonium Chloride. Sat'd. 75 F. YES. YES. NO. Ammonium Hydroxide. 28%. 75 F. YES. YES. NO. Ammonium Hydroxide. 10%. 75 F. YES. YES. NO. Ammonium Sulfate. Sat'd. 75 F. YES. YES. NO. Ammonium Thiocyanate. Sat'd. 75 F. YES. YES. NO. Amyl

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