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Application Of Phase Contrast Microscope

 

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Semiconductors (metalloids) or semiconductor materials are used to fabricate microelectronic and optoelectronic devices such as transistors, photodetectors or solar cells.
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Parts by Number for Application Of Phase Contrast Microscope Top

Partb # Distributor Manufacturer Product Category Description
AO-49402-12 Amazon COLE-PARMER Industrial & Scientific Labomed Basic Phase Contrast Microscope, Trinocular
AO-49402-13 Amazon COLE-PARMER Industrial & Scientific Labomed Advanced Phase Contrast Microscope, Binocular
AO-49402-11 Amazon COLE-PARMER Industrial & Scientific Labomed Basic Phase Contrast Microscope, Binocular
1433PHI Amazon Vee Gee Scientific Industrial & Scientific VanGuard 1433PHI Brightfield, Phase Contrast Clinical Microscope with Trinocular Head, Halogen Illumination, 10X, 20X, 40X, 100X Magnification, 360 Degree Viewing Angle, Trinocular Head
1423PHI Amazon Vee Gee Scientific Industrial & Scientific VanGuard 1423PHI Brightfield, Phase Contrast Clinical Microscope with Binocular Head, Halogen Illumination, 10X, 20X, 40X, 100X Magnification, 360 Degree Viewing Angle, Binocular Head

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  • Metallurgical Inspection Using A Scanning Electron Microscope
    microstructural features. These features can be observed with. conventional optical microscopy. However, when higher magnification and 3D detail is required, a scanning. electron microscope (SEM) is best suited. The PhenomTM is a desktop SEM that exceeds the resolution shows the -laths (darker phase
  • Surface Profiling by Frequency Domain Analysis of White Light Interferograms
    calculation of phase angles. However, recognizing that the same basic. principle is involved can be very useful in the selection of a data processing scheme. In white light interferometry the point of highest fringe contrast -- the coherence peak -- is the. most distinctive feature of the broadband
  • MICRO: Product Technology News (October 2000)
    009;Highly stable Eclipse L200 and L200D IC-inspection microscopes incorporate patented CFI optics for clear images, high contrast, and minimal flare. Long working distances and high numerical apertures are possible even at the extremes of magnification, providing bright images with good edge
  • MICRO: Behind the Mask
    photomasks include specialized structures that enhance the contrast and resolution of the image that will be transferred to the wafer. Resolution-enhancement techniques add or subtract small features from the pattern to improve the fidelity of the transferred image. Phase shifters manipulate light
  • MICRO: Behind the Mask- Kasprowiez (Feb 2000)
    and Benjamin G. Eynon, Photronics. The limitations of optical tools for small-dimension and phase-shift mask measurement dictate that photomask manufacturers consider a dual-tool metrology strategy. In semiconductor wafer dimensional metrology, the critical dimension scanning electron microscope (CD SEM) has
  • MICRO:Product Technology News (Oct '99)
    , it permits users to completely control image contrast, brightness, color, edge enhancement, and parallel-port digital-image computer transfer. An optional 6.4-in. LCD color display, which is offered for the convenient viewing of the subject, is mounted on the camera's remote head for simple
  • MICRO: Product Tech News
    applications. Incorporating important advancements in physical and voltage contrast sensitivity to enable fast root-cause analysis, the unit has an extended landing-energy range to enhance the capture of slight, underetched contact defects. Beam current and scanning flexibility options can capture
  • Luminescence Lifetime Imaging with Transparent Oxygen Optodes
    to conventional luminescence intensity imaging. tivelylargeStokesshiftwithanemissionmaximumat605 nm,. It allows for a good contrast enhancement and for a back-. that favours its application for luminescence lifetime imaging. ground suppression if unwanted luminescence contributions. The sensor area

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