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  • MICRO: Product Technology News (October 2000)
    009;Highly stable Eclipse L200 and L200D IC-inspection microscopes incorporate patented CFI optics for clear images, high contrast, and minimal flare. Long working distances and high numerical apertures are possible even at the extremes of magnification, providing bright images with good edge
  • MICRO: Manufacturing Effectiveness
    challenges facing defect and lithography metrology at future technology nodes. In addition to describing patterned-wafer defect-detection tools, it compares state-of the-art equipment to requirements and explores future directions. Finally, it explores both CD and overlay metrology. Bright-field, dark-field

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