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  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    this week bolstered optimism about the prospects of 157-nm exposure tools because new information suggests intrinsic birefringence effects in calcium fluoride (CaF2) lens material can be managed, said International Sematech, which hosted the event. ESS rolls out single-chip DVD solution FREMONT, Calif
  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    awarded a contract by International Sematech to develop a measurement system that characterizes a major lens-aberration problem in 157-nm lithography tools. The proposed instrument will characterize and measure intrinsic birefringence in calcium fluoride (CaF2) materials in 157-nm tools. In May

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