Even from its earliest days, semiconductor fabrication has challenged and pushed the realm of automated, ultra-clean manufacturing. From pressurized work environments to
high vacuum deposition
chambers, getting power, control and monitoring signals into and out of these non-atmospheric pressure and
vacuum environments presents a constant challenge. When you consider that the slightest amount of contamination, from ambient air to dust, could scrap a $100,000+ wafer, this is an area that does...
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