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Cleanroom Characterization

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Environmental testing and analytical services provide testing of environmental samples such as soil, water, air, and industrial wastes or byproducts.
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  • Description: TÜV Rheinland ® Industrial Solutions (TRIS) combines the superior services of Non-Destructive Testing Services, Inc., Unified Testing Services, Inc. and TÜV Rheinland Industrial Solutions to better meet the requirements of national and international industrial clients. TRIS provides a full range
    • Industry Applications: Aerospace / Aviation, Automotive, Chemical / Material Processing, Cleanroom, Food / Beverage, Health Care / Medical, Legal / Forensics, Marine, Military, Nuclear / Utility, Pharmaceutical / Biotech, Packaging, Piping / Pressure Vessel, Semiconductors / Electronics, Structural / Construction, Specialty / Other
    • Capabilities: Cleanliness Monitoring / Testing, Deformulation / Reverse Engineering, Environmental Exposure Testing, Environmental Testing and Analysis Services, Failure Analysis, Field Sampling, Geotechnical Services, Monitoring Programs (Audits / Surveillance), Quality / Purity (Contamination - Alloys, Polymers, etc.), Reactivity (Corrosivity, Toxicity, Ignitability), Report Preparation, Sample Pickup / Report Courier, Sample Retention, Standards Testing / Certification, Sunlight Exposure / Solar Simulation, Umpire Testing, Waste Characterization, Other
    • Materials: Adhesives / Sealants, Asbestos / Fibers, Ceramics / Glass, Coatings, Composites, Concrete / Mortar, Fuel Cell / Battery Materials, Metals, Paper, Petroleum Fluids (Oil, Fuel, Distillates), Plastic / Rubber, Polymers / Organics, Soil, Textiles, Thin Films / Plating, Toxins / Restrictive Substances, Wafers / Surfaces, Welds / Joints
    • Test Methods: Diffraction (X-ray, Electron, etc.), Mechanical Testing, Microscopy / Metallography, Nondestructive Testing, Property Testing, Scanning Electron Microscopy, Thermal Analysis, X-ray Fluorescence (XRF), X-ray Radiography
  • Description: and Z scanning system, allows for characterization of undercut features as well as top surfaces. In using Park Systems’ True Non-Contact mode, the XE-3DM can realize non-destructive imaging of soft photoresist structures at the same scanning speed as any other XE-series platform. High
    • Form Factor: Monitor / Instrument
    • Mounting / Loading: Floor Mounted / Stand-alone
    • Applications: Semiconductor Wafers
    • Measurement Capability: Critical Dimension / Trench Geometry, Defects / ADC, Roughness / Waviness
  • Description: Business Challenge With the increasing complexity of large infrastructure projects it has become essential to verify the quality of structural steel components prior to delivery and to assure they are durable, safe and perform as designed. With clients such as Federal, State, County, City, and
    • Industry Applications: Aerospace / Aviation, Automotive, Chemical / Material Processing, Cleanroom, Food / Beverage, Health Care / Medical, Legal / Forensics, Marine, Military, Nuclear / Utility, Pharmaceutical / Biotech, Packaging, Piping / Pressure Vessel, Semiconductors / Electronics, Structural / Construction, Specialty / Other
    • Capabilities: Assays / Quantitative, Chemical Testing Services, Cleanliness Monitoring / Testing, Deformulation / Reverse Engineering, Environmental Exposure Testing, Environmental Testing and Analysis Services, Failure Analysis, Field Sampling, Geotechnical Services, Monitoring Programs (Audits / Surveillance), Quality / Purity (Contamination - Alloys, Polymers, etc.), Reactivity (Corrosivity, Toxicity, Ignitability), Report Preparation, Sample Pickup / Report Courier, Sample Retention, Standards Testing / Certification, Sunlight Exposure / Solar Simulation, Umpire Testing, Waste Characterization, Other
    • Materials: Adhesives / Sealants, Asbestos / Fibers, Ceramics / Glass, Chemicals, Coatings, Composites, Concrete / Mortar, Cosmetics (Creams, Sunblocks, etc.), Fuel Cell / Battery Materials, Gases, Inorganics, Metals, Nanomaterials, Paper, Petroleum Fluids (Oil, Fuel, Distillates), Plastic / Rubber, Polymers / Organics, Powders, Soil, Textiles, Thin Films / Plating, Toxins / Restrictive Substances, Wafers / Surfaces, Welds / Joints
    • Test Methods: Acoustic Microscopy (SAM), Ash Testing / Filler Content, Atomic Absorption Spectroscopy (AA), Auger Spectroscopy (AES), Chemical Extraction, Chromatography (GC, HPLC, etc.), Combustion Analysis, Diffraction (X-ray, Electron, etc.), Hermeticity Testing, Inductively Coupled Plasma (ICP, LA-ICP, etc.), Infrared Spectroscopy (FTIR, etc.), Isotopic Analysis, Mass Spectroscopy (RGA, etc.), Mechanical Testing, Microscopy / Metallography, Nondestructive Testing, Optical Emission Spectroscopy, Particle Size / Sieve Analysis, Property Testing, Rheology, Scanning Electron Microscopy, Spectroradiometric, Thermal Analysis, Trace Analysis (ppm, ppb, ppq), UV / Vis Spectroscopy, Wet Chemical Analysis, X-ray Fluorescence (XRF), X-ray Radiography
  • Description: and Z scanning system, allows for characterization of undercut features as well as top surfaces. In using Park Systems’ True Non-Contact mode, the XE-3DM can realize non-destructive imaging of soft photoresist structures at the same scanning speed as any other XE-series platform. High
    • Form Factor: Monitor / Instrument
    • Mounting / Loading: Floor Mounted / Stand-alone
    • Applications: Semiconductor Wafers
    • Measurement Capability: Critical Dimension / Trench Geometry, Defects / ADC, Roughness / Waviness
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Conduct Research Top

  • Evaluating sample preparation techniques for cleanroom wiper testing
    Himansu R. Bhattacharjee and Steven J. Paley, Texwipe The testing of cleanroom wipers has evolved over the past 20 years from simply shaking a material and visually approximating the amount of lint released to much more complex methods of separating particles from the wiper followed...
  • Meeting the challenge of submicron defect characterization on final-polished wafers
    . Characterization of Particulate LPDs Particulate LPDs on final-polished wafers can come from various sources, including the abrasives used in slurries (e.g., SiO2 particles); polishing debris; airborne particles in cleanroom fabs; and contaminants transferred from such process and handling equipment...
  • INDUSTRY NEWS
    NASA is offering the services of a 24,000-sq-ft R&D fab and cleanroom facility at the agency's Goddard Space Flight Center as part of its new campaign to showcase the commercialization capabilities of the national labs. NASA chose to highlight the Goddard facility, called the Detector Development...
  • MICRO:Cleanroom Technologies by Roger W. Welker, p.47 (May '99)
    The first installment in a three-part series focuses on which contamination and ESD tests are appropriate for the qualification of cleanroom gloves. Roger W. Welker, R.W. Welker Associates; and Peter G. Lehman, Cleanroom gloves are critical to high-technology manufacturing. A brief search...
  • MICRO: Interview
    With a 200-mm cleanroom and a 300-mm facility almost up and running, the institute collaborates with more than 500 partners, including dozens of the biggest chipmakers and suppliers on the semiconductor playing field. In October, IMEC announced that Taiwan Semiconductor Manufacturing Co. has joined...
  • MICRO:Industry News:'Round the Circuit (Nov/Dec '98)
    A new Sematech-funded study will determine the cleanroom compatibility of so-called "firesafe" plastics used in fab environments. The R&D consortium has hired Factory Mutual Research Corp. (FMRC) of Norwood, MA, to examine the leaching, chemical resistance, and outgassing characteristics...
  • Justifying a continuous contamination monitoring system
    Traditionally, many approaches have been taken to measure contamination or the factors believed to influence contamination levels in cleanrooms. It is universally recognized that the cleanroom must be positively pressurized with respect to the general factory environment. In most cleanrooms...
  • MICRO: Expansions and Acquisitions
    companies will work at the cleanroom facility, which is scheduled to open by the end of 2002. They will focus on developing advanced technologies such as phase-shift masks and OPC masks for manufacturing devices with design rules 0.13 um. The joint venture has a similar structure to the DPI Reticle...
  • MICRO:Archives of 1997 Back Issues
    Big changes needed to satisfy cleanroom, boardroom, exec says Show's explosive growth mirrors IC industry expansion on island MEMC chooses McCarthy for 300-mm line; Air Products, BOC split bill on new plant; ASML to more AZ site; Parker Alabama facility opens Planar chooses YieldUP; ASML sells...
  • MICRO: Archive: Back Issue TOC
    , polysilicon furnaceware, photoresists, remote particle counters, copper plating additives, cleanroom cabinetry, photoelectron spectroscopy, copper seed solution, exhaust-pressure controller, dry etch tool Cleaning tool enhanced with eight double-side process modules; vendor offers remote capability...

Engineering Web Search: Cleanroom Characterization Top

Home | NRC
facilities, equipment and expertise to enable and facilitate interdisciplinary research in micro- and nano-fabrication and characterization.
Cornell NanoScale Science & Technology Facility
from outside Cornell) use the fabrication, synthesis, computation, characterization, and integration resources of CNF to build structures, devices,
ETH - FIRST - FIRST - Frontiers In Research: Space &...
CLA-MEMS-Cleanroom Binning and Rohrer Nanotechnology Center, IBM & ETHZ
BNL Center for Functional Nanomaterials
Synthesis and Characterization Benchtop light microscopes - one with motorized stage & digital readout - Nikon (Cleanroom)
BNL Center for Functional Nanomaterials | Synthesis and...
Synthesis & Characterization Advanced Optics Synthesis and Characterization Facility
Center for Nanoscale Systems - CNS - Harvard University -...
How Do I Become a LISE Cleanroom User? ?
Assembly and Fabrication – - Lieber Research...
Characterization-1 Sonicator Cleanroom Characterization Biology Lab Tour Research Sponsors
Thermal and Airflow Design Services - Mentor Graphics
Non-destructive dynamic thermal characterization of semiconductor devices and LEDs
See Mentor Graphics Corporation Information
Microelectromechanical systems - Wikipedia, the free...

ONAMI | Home
Center for Advanced Materials Characterization OSU Owen Cleanroom Capabilities-at-a-Glance

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