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Evaluating sample preparation techniques for cleanroom wiper testing
Himansu R. Bhattacharjee and Steven J. Paley, Texwipe The testing of cleanroom wipers has evolved over the past 20 years from simply shaking a material and visually approximating the amount of lint released to much more complex methods of separating particles from the wiper followed...
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Meeting the challenge of submicron defect characterization on final-polished wafers
. Characterization of Particulate LPDs Particulate LPDs on final-polished wafers can come from various sources, including the abrasives used in slurries (e.g., SiO2 particles); polishing debris; airborne particles in cleanroom fabs; and contaminants transferred from such process and handling equipment...
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INDUSTRY NEWS
NASA is offering the services of a 24,000-sq-ft R&D fab and cleanroom facility at the agency's Goddard Space Flight Center as part of its new campaign to showcase the commercialization capabilities of the national labs. NASA chose to highlight the Goddard facility, called the Detector Development...
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MICRO:Cleanroom Technologies by Roger W. Welker, p.47 (May '99)
The first installment in a three-part series focuses on which contamination and ESD tests are appropriate for the qualification of cleanroom gloves. Roger W. Welker, R.W. Welker Associates; and Peter G. Lehman, Cleanroom gloves are critical to high-technology manufacturing. A brief search...
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MICRO: Interview
With a 200-mm cleanroom and a 300-mm facility almost up and running, the institute collaborates with more than 500 partners, including dozens of the biggest chipmakers and suppliers on the semiconductor playing field. In October, IMEC announced that Taiwan Semiconductor Manufacturing Co. has joined...
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MICRO:Industry News:'Round the Circuit (Nov/Dec '98)
A new Sematech-funded study will determine the cleanroom compatibility of so-called "firesafe" plastics used in fab environments. The R&D consortium has hired Factory Mutual Research Corp. (FMRC) of Norwood, MA, to examine the leaching, chemical resistance, and outgassing characteristics...
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Justifying a continuous contamination monitoring system
Traditionally, many approaches have been taken to measure contamination or the factors believed to influence contamination levels in cleanrooms. It is universally recognized that the cleanroom must be positively pressurized with respect to the general factory environment. In most cleanrooms...
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MICRO: Expansions and Acquisitions
companies will work at the cleanroom facility, which is scheduled to open by the end of 2002. They will focus on developing advanced technologies such as phase-shift masks and OPC masks for manufacturing devices with design rules 0.13 um. The joint venture has a similar structure to the DPI Reticle...
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MICRO:Archives of 1997 Back Issues
Big changes needed to satisfy cleanroom, boardroom, exec says Show's explosive growth mirrors IC industry expansion on island MEMC chooses McCarthy for 300-mm line; Air Products, BOC split bill on new plant; ASML to more AZ site; Parker Alabama facility opens Planar chooses YieldUP; ASML sells...
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MICRO: Archive: Back Issue TOC
, polysilicon furnaceware, photoresists, remote particle counters, copper plating additives, cleanroom cabinetry, photoelectron spectroscopy, copper seed solution, exhaust-pressure controller, dry etch tool Cleaning tool enhanced with eight double-side process modules; vendor offers remote capability...