CMP Suspension

Products/Services for CMP Suspension

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  Abrasive Compounds and Abrasive Slurries - (291 companies)

  ...compounds for water-soluble or oil-soluble lapping machines, slurries and suspensions that are specially designed for providing superior finishes, and polishing fabrics or pads. Typically, polishing pads are used on hard surfaces such as ceramic... Search by Specification | Learn More

  Type:

  • Cleaning / Surface Preparation
  • CMP / Wafer Planarization
  • Cutting Compound
  • Lapping
  • Polishing

  Products / Materials Finished:

  • Aluminum
  • Cast Iron
  • Ceramics / Glass
  • Chrome / Chromium Plating
  • Coatings / Paint

  Form:

  • Liquid / Dispersion
  • Paste / Cream
  • Powder
  • Slurry
• 
  Laps and Lapping Tools - (64 companies)

  Laps and lapping tools are used for precision surface finishing, often in conjunction with loose abrasive compounds. Learn More
• 
  Buffs and Buffing Wheels - (108 companies)

  Buffs and buffing wheels are used to hold finishing compounds and polish parts made of metal, plastic, ceramic, glass, wood, stone, silicon, or optical materials. Search by Specification | Learn More
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  Air Springs - (44 companies)

  Air springs contain a column of air in an elastomeric bellow or sleeve to provide suspension, isolation, or actuation. Commonly found in vehicle suspension systems, perhaps in conjunction with a coil spring, they are also used to insulate vibration... Search by Specification | Learn More
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  Semiconductor Wet Process Equipment - (131 companies)

  Semiconductor wet process equipment performs a variety of wet processing applications including etching, washing, chemical mechanical polishing (CMP), and spin coating in semiconductor or microelectronics manufacturing. Semiconductor wet process... Learn More
• Suspended Growth Treatment Systems - (10 companies)

  Suspended growth treatment systems freely suspend microorganisms in water. They use biological treatment processes in which microorganisms are maintained in suspension within the liquid. In suspended growth treatment systems, microorganisms convert... Learn More
• Industrial Hoists - (903 companies)

  Industrial hoists are designed with a number of mounting configurations to cover a wide range of applications. The most common configurations include trolley mount, lug mount, and suspension hook. Custom configurations are also available. Trolley... Search by Specification | Learn More
• Honing, Lapping, and Super-finishing Machines - (121 companies)

  ...devices for very fine finishing include equipment are designed for wafer planarization or chemical- mechanical polishing (CMP). Wafer planarization or CMP processes are used to finish and maintain flatness of silicon wafer during chip fabrication. Search by Specification | Learn More
• Ion Selective Electrodes - (68 companies)

  Ion selective electrodes measure the potential of a specific ion in solution. This potential is measured against a stable reference electrode of constant potential. Search by Specification | Learn More
• Cable Transits - (46 companies)

  Cable transits are bulkhead or barrier modules that allow electrical cables to pass through, while providing various levels of sealing, strain relief, and damage protection, depending on the application requirements. Search by Specification | Learn More

Product News for CMP Suspension

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  Simrit
  CMP Gaskets and Membranes

  New process is changing the way semiconductor products are produced. Simrit, a division of Freudenberg-NOK, introduced its new product line of chemical mechanical planarization (CMP) gaskets and membranes at the SEMICON West 2007 show in San Francisco (July 16 to 20, 2007). "Simrit is excited to announce its new line of elastomer products for CMP processes," said Patrick Giorda, director, semiconductor market, Simrit. "The new line of CMP consumable parts will include membranes and gaskets... (read more)
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  Saint-Gobain Surface Conditioning Group
  Fine Polishing Slurries for Electronic CMP

  Chemical Mechanical Planarization (CMP) has become one of the vital processes in the production of semiconductor devices which use slurries and pads to polish/planarize the surface of wafers to near defect free surfaces. Saint-Gobain's Polycrystalline Alumina Polishing Slurries are extremely fine particle/slurries intended for semiconductor and electronic materials CMP processes. Products are designated Gen 2, Gen 3, Gen 4, and Gen 5 Polycrystalline Alumina. (read more)

  Browse Abrasive Compounds and Abrasive Slurries Datasheets for Saint-Gobain Surface Conditioning Group
• 
  Tekscan, Inc.
  CMP Wafer Polishing Pressure Distribution

  The I-Scan® system provides the diagnostic tools necessary to evaluate, view, and balance the forces acting on a silicon wafer during the polishing process. A study was conducted to collect and analyze the pressure distribution under a polishing head. Using a unique I-Scan pressure sensor with a sensing area of 9 1/2" X 9 3/4", measurements were taken to determine the pressure distribution of the polishing head and the wafer interface. Balancing these pressures during machine set-up can assist... (read more)
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  ANVER Corporation
  Suction Cups and Suspensions

  ANVER OC Series Oval Vacuum Cups, snap-on fittings, and suspensions are designed to retain their position and will not rotate for applications where product alignment is critical. Featuring more surface area than round cups, these oval cups are ideal for use with long narrow lifting surfaces and are available molded from non-marring silicone or Nitrile. Suitable for a wide range of automation systems and packaging machinery, ANVER OC Series Oval Vacuum Cups, snap-on fittings, and suspensions... (read more)

  Browse Vacuum Cups and Vacuum Pads Datasheets for ANVER Corporation
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  Advanced Abrasives Corp.
  Slurry & Suspension

  Regardless of your process, Advanced Abrasives has the right solution. Their slurries have a very low viscosity for ease of application using dispensers and sprayers. The suspensions are ideal when continuous stirring or shaking is not an option but homogeneous dispersion of diamond is required. The company offers three base formulas that can be tailored to your application: Water Base - formulated for ease of use in lapping and polishing systems where fast removal rates with high surface... (read more)

Parts by Number for CMP Suspension