Products/Services for CO2 Snow Cleaning Wafers
Cleaning Agents and Surface Treatments - (2123 companies)
Product News for CO2 Snow Cleaning Wafers
Linde North America Inc.
CRYOCLEAN®snow –CO2 blasting without pellets. CO2 based Cleaning. CRYOCLEAN® Blasting. In the CRYOCLEAN® process, carbon dioxide snow of -108°F ( -78°C) is blasted at high velocity onto the surfaces of the workpiece (component) to be cleaned. On impact, the dry ice immediately vaporizes, removing dirt and impurities while leaving the cleaned surface clear of grit or sludge residue. CRYOCLEAN snow blasting is a fast and dry cleaning process that has often replaced corrosive or aggressive solvents in many industrial and environmental... (read more)
MEI Solar Wafer Cleaning Equipment Automated Solar Wafer Cleaning. Dry to Dry High Throughput, Process Multiple Lots and Recipes Simultaneously. The MEI Solar Evolution high throughput wet processing systems are in-line, configurable, automated, modular, linear batch immersion systems made for high throughput at a low cost. They are designed to clean photovoltaic/ solar wafers for many applications. We also make custom equipment for polysilicon and ingot cleaning, and wafer re-work. For Solar wafer processing, the MEI Solar... (read more)Browse Semiconductor Wet Process Equipment Datasheets for MEI, LLC
CO2 Incubators to changes in chamber humidity and temperature fluctuations, and is therefore fundamentally unsuitable for use in CO2 incubators. Uniquely, the Galaxy IR Sensor can remain in the chamber during the entire high-temperature disinfection cycle, ensuring that all chamber components are sterilized. Simplified Cleaning: On all models, the chambers are pressed from a single sheet of stainless steel, with no welds or seams, eliminating another potential source of contamination. In combination... (read more)Browse Incubators Datasheets for Eppendorf, Inc.
JST Manufacturing, Inc.
For precision drying of silicon wafers IPA Vapor Dryer. JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products. Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective... (read more)Browse Semiconductor Wet Process Equipment Datasheets for JST Manufacturing, Inc.
JST Manufacturing, Inc.
IPA Vapor Dryer maintains the cleaning process. IPA Vapor Dryer. ST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products. Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective... (read more)Browse Process Dryers Datasheets for JST Manufacturing, Inc.
Terra Universal, Inc.
Wet Processing and Cleaning Stations Versatile Wet Cleaning Benches & High-Purity Chemical Processing Systems. Terra's Modular Wet Processing and Cleaning Benches provide economical solutions for acid etching, semiconductor wafer processing, chemical rinsing and drying, and other wet chemical processes. Their modular, ergonomic bench top design allows flexible configuration of wet processing modules, maximizes purity, and minimizes the threat of chemical carry-over and wafer contamination during wafer rinsing. Simply select... (read more)Browse Clean Benches Datasheets for Terra Universal, Inc.
Automated Polysilicon Chunk and Ingot Cleaning Remove Organic & Metallic Contamination. Fast, Oxide-free drying in a small footprint. MEI introduces an automated Polysilicon chunk cleaning system for removal of organic and metallic contamination found on polysi. MEI's high throughput wet etch system with good process control and outstanding drying capabilities achieve optimal purity with cool to the touch output. MEI's automated system for chunk polysilicon cleaning removes silicon-chunk surface contaminants and offers exceptional... (read more)Browse Semiconductor Wet Process Equipment Datasheets for MEI, LLC
Ideal For Use In Carpet Cleaning Applications! Specifically designed to handle rigorous duty cycles, high temperatures and chemicals. • Ideal for use in carpet cleaning and other high pressure cleaning applications. General Pump, along with our parent company, Interpump Group S.r.l. , has been the world leader in plunger pump development since 1982. While known as the leader in plunger pumps for the pressure cleaning industry, we have expanded to serve Vehicle Wash as well as many Industrial Applications including Sewer Jetting, Oil... (read more)Browse Piston Pumps and Plunger Pumps Datasheets for General Pump
Technical Glass Products, Inc. - OH
IDEAL for the Processing of Silicon Wafers calculator applications available here. Trace Impurities. Transmittance Curves. Usage Guidelines. Cleaning. The cleaning of fused quartz is critical before it is used in any application. The fused quartz should be cleaned by placing it in a 7% maximum solution of Ammonium Bifluoride for no more than ten (10) minutes, or a 10% volume maximum solution of Hydrofloric Acid for no more than five (5) minutes. After cleaning, using the above method, the fused quartz should be rinsed in deionized... (read more)Browse Glass Materials Datasheets for Technical Glass Products, Inc. - OH
E+E Elektronik Corp
CO2 Transmitter for HVAC - EE85 The EE85 CO2 transmitter is ideally suited for duct mounting in the fields of building management and demand controlled ventilation. The elegant, compact housing enables easy installation directly at the ventilation duct using a mounting flange. The EE85 C02 transmitter is also available with an integrated passive temperature measurement. The CO2 transmitter operates according to the infrared principle (NDIR). The patented auto-calibrate function compensates for any ageing effects (even... (read more)Browse Gas Transmitters Datasheets for E+E Elektronik Corp
Parts by Number for CO2 Snow Cleaning Wafers
|Part #||Distributor||Manufacturer||Product Category||Description|
|4545-00A||Terra Universal, Inc.||Industrial Parts Washers and Cleaning Systems||electronic components. Portable, easy-aim design and adjustable nozzles provide broad or very localized cleaning of hard-to-reach surfaces. Environmentally friendly operation eliminates the need for solvent disposal —contaminants are carried away in a stream of inert CO2. Low operating cost: CO2...|
Engineering Web Search: CO2 Snow Cleaning Wafers
Ablation and Sorptive Removal of Films and Particles from...
dioxide (CO2)-based cleaning processes can utilize several states or forms of CO2, such as SC-CO2, L-CO2, or the pelletized form of CO2, frequently
Carbon Dioxide (CO2) Cleaning Systems: ACI ecoTec GmbH
CO2 Snow-Jet Cleaning Process The acp - advanced clean production GmbH is worldwide
See ACI-ecoTec GmbH & Co. KG Information
Carbon Dioxide Snow Examination and Experimentation
Spray cleaning surfaces with this CO2 "snow" has been shown to remove particles and other debris without damage.
CorWet - acp - advanced clean production GmbH
Products CO2-Snow Jet Cleaning Wet-Processing
Technologie - acp - advanced clean production GmbH
Technology CO2-Snow Jet Cleaning Wet-Processing
204 Meeting Symposia
Integration of High-k Gate Dielectrics ? Wet Etch, Cleaning and Surface Conditioning - S. De Gendt, S. Beckx, M. Caymax, M. Claes, T. Conard, A.
See Electrochemical Society (The) Information
Comparison of laser and C02 snow cleaning of astronomical...
Cleaning effectiveness was determined from studies of residual particle densities and size distributions (measured from low-magnification optical
Publications of the Astronomical Society of the Pacific 107:...
in Sec. 5. 2. CO2-SNOW AND UV-LASER-CLEANING TECHNIQUES 2.1 CO2-Snow Cleaning CO2 snow is generated by expelling pressurized liquid CO2 from a nozzle