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Darkfield Illumination

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  • MICRO:May 98:Product Technology News
    Designed for inspecting wafers in CMP and other advanced interconnect processes, the ILM-2230 combines small-pixel, high-data-rate image processing with oblique-angle darkfield laser illumination for high-throughput production line monitoring. By reflecting light off the wafer at an angle instead
  • LEDs Line Up to Illuminate Web Inspections
    brightfield, darkfield, or, in some cases, as backside illumination systems. In brightfield illumination, linear lights are co-aligned with the camera such that light will be directed back to the camera from any surface that is parallel to the sensor. Light reflected from surfaces that are not parallel
  • MICRO:April 98:Industry Lead Story
    . To enhance sensitivity to surface and subsurface defects, the brightfield image is analyzed in parallel with the four darkfield images, Applied says. Positioned above the wafer, the brightfield channel captures defect "signatures" that result from "the vertical illumination of the wafer surface
  • MICRO: Products
    for dark-field imaging at smaller technology nodes. The tool uses short-pulsed UV illumination and a large 2-D focal plane assembly (FPA) to create die-sized images. The FPA enables a large field of view, improving throughput and reducing overhead. The UV illumination source also enables high optical
  • MICRO:Product Technology News (Feb 99)
    Designed for making semiconductors with geometries 0.18 um, the AIT II patterned process tool monitor minimizes the number of wafers exposed to out-of-control process conditions. The system incorporates double-darkfield technology, which combines low-angle illumination and low-angle collection
  • MICRO: Manufacturing Effectiveness
    challenges facing defect and lithography metrology at future technology nodes. In addition to describing patterned-wafer defect-detection tools, it compares state-of the-art equipment to requirements and explores future directions. Finally, it explores both CD and overlay metrology. Bright-field, dark-field
  • MICRO:Defect Inspection Equipment, by Thomas Reuter (Oct '99)
    low-angle laser illumination and dark-field collection optics. While drawing on the design of its predecessor, the new inspection tool offers enhanced sensitivity and throughput. Developed to meet the inspection requirements of 0.18-um design rules and

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