Deposition Spray Stations

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• MICRO: Products
  Available on the Zeta G3 spray cleaning platform, ViPR technology eliminates the need for approximately 80% of FEOL ashing steps during most implanted photoresist stripping, including plasma-doped photoresist. The process uses proprietary chemical blending, delivery, and temperature control...
• MICRO: Products
  for gallium arsenide and silicon direct writing, integrated optics, mask production, and applied research. The XTC/3 thin-film deposition controller provides accurate control of deposition rate and thickness in an affordable, easy-to-install package. Equipped with the patented ModeLock feature, the unit...
• MICRO: Product Tech News
  of hazardous chemicals. Because the dry ice particles disappear on impact, the unit eliminates secondary waste streams. It is used for cleaning wafers, stripping high-dose implanted photoresists, cleaning polymer films off anodized or spray-coated aluminum chambers, cleaning valve bellows and quartzware...
• Condition Monitoring of Steam Turbines by Performance Analysis
  , particularly the primary flow measurement, were closely examined, but no discrepancy could be found. In operation, there was difficulty in holding hot reheat temperature down to the design values, and an extra desuperheating temperature control spray station was added to the boiler. A significant portion...
• MICRO: Cox (March 2001)
  , nitrogen as N2, argon (Ar), and oxygen (O2) enter the quench station, where a water spray cools them so that they can be processed further. After being cooled, the gases enter a postreaction tower, where they are separated in a second packed column that is similar in form and function to the one...
• The Camara Oscura Being Developed by South Coast Photonics Could Revolutionize the Way Roll-to-Roll Manufacturing of Electronic
  of a cartridge, rail, skate, heads, and station. The cartridge holds a roll of substrate on a spindle and contains all the mechanisms and guides needed to unwind the substrates and pass it across the deposition zone — a gap that exposes the substrate. The cartridge is much like a cassette tape...
• TA022: Benefits and Challenges in Decreasing GaAs through Substrate via Size and Die Thickness
  for the seed layer deposition. As the via. bumping and flip chip die bonding to modules or boards. sizes decreased and aspect ratios increased, adequate. Flip chip wafer bumping foundaries have recently started. sputtered seed layer coverage throughout the vias became. to solicit business from GaAs device...
• MICRO: Industry News
  on their batch counterparts. "In additon to processes such as bevel etch that are unique to single-wafer processing, customers are migrating to single-wafer cleans to avoid particle deposition, which is an inherent factor in batch processing. This is especially true for contaminants removed from the back...
• Product Technology News
  Advanced Engineering Products Hayward, CA The SC-9000 spray cleaner holds up to 10 complete sets of 8-in. wafer shippers or 30 8-in. WIP cassettes. The fully automated cleaner features a single-chamber, multiprocess design that ensures tight control over the cleaning environment. An arm fitted...
• Product Technology News
  , and a PC running proprietary software for camera control and data analysis. Working in real-time, the system records video images of the wafer during processing and uses the images to calculate etching or deposition rate, uniformity, end point, and selectivity. It is suitable for all plasma...

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