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  • MICRO: Behind the Mask -Chen (April 2000)
    patterned defect inspection system (KLA-Tencor, San Jose) running the advanced performance algorithm (APA). Both i-line and deep ultraviolet (DUV) Verithoro programmed defect masks from DuPont Photomasks were investigated. Although engineers have traditionally used shearing microscopes to measure
  • MICRO: Products
    laser ellipsometer and an integrated DUV reflectometer with a photomultiplier detector, S200/S300- metrology systems can characterize nitrided gate oxides. Measurements of thicknesses and nitrogen concentrations of dielectric films of 15 to 20 A can be performed accurately and repeatably. The system

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