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  • Using emission spectroscopy to perform impurity analyses in UHP gases
    , but of equal importance was the use of a new technique: emission spectroscopy. When excited in an electric discharge, the gases dissipated some of the energy as electromagnetic radiation at wavelengths that were specific to each gas. The spectral lines were intense enough to be easily observable
  • Overview of Rotating Disc Electrode (RDE) Optical Emission Spectroscopy for In-Service Oil Analysis
    The basis of modern oil analysis is the use of optical emission spectroscopy (OES) to measure the ppm (parts per million) levels of wear metals, contaminants and additives in oil samples. Whatever else an oil lab may measure, a multi-elemental analysis is the core of in-service oil analysis
  • Detection of hydrocarbon radicals during plasma etching
    Optical emission spectroscopy is used to study and monitor the plasma etching of. hydrogenated amorphous carbon (a-C:H) thin films.
  • Measurement of Elemental Impurities in Pharmaceutical Products by ICP-AES and ETAAS
    Electrothermal atomic absorption spectrometry (ETAAS) and inductively coupled plasma atomic emission spectroscopy (ICP-AES) are widely used as trace metal analytical methods. In addition, they are also effective for analysis of metallic impurities in pharmaceutical products and their raw materials
  • A Spectroscopy Guide for PAT
    of fluorescing is "multidirectional, " the detectors are placed perpendicular to the incident light. Thus, unlike UV/Vis, small absorbances (followed by emission) and not the total ouput of the light source are seen against a "dark " background. This allows for detection of trace amounts of analyte
  • Atmospheric Plasma Analysis by Molecular Beam Mass Spectrometry (.pdf)
    The use of atmospheric plasmas is growing in interest due to their advantage in processing materials, mainly organic, which are not suitable for high vacuum. Such discharges are commonly studied by optical emission spectroscopy but, to understand the surface properties of the treated material
  • Detrimental Element Analysis of Non-Metallic Materials Used in Nuclear Reactors
    for halogens, sulfur, and low-melting point metals by ASTM D129, E144 and D3761, using oxygen bomb or water leaching preparation with ion chromatography (IC) and inductively-coupled plasma (ICP) optical emission spectroscopy (OES or AES) is described. Some independent testing laboratories are approved
  • * Lubricating Oil Analysis by Benchtop WDXRF According to ASTM D6443-04
    with a transparent film. Unlike traditional. techniques, such as Inductively-Coupled Plasma. Optical Emission Spectroscopy (ICP-OES), XRF does. not require chemical decomposition, digestion or serial. dilution. ASTM D6443-04 specifies the use of the. wavelength-dispersive (WD) XRF technique

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